Substrate treating apparatus and substrate treating method

Patent metadata

Field	Value
Publication number	US-9275852-B2
Application number	US-201313905754-A
Country	US
Kind code	B2
Filing date	May 30, 2013
Priority date	May 31, 2012
Publication date	Mar 1, 2016
Grant date	Mar 1, 2016

Abstract

Provided is an apparatus for treating a substrate using a supercritical fluid. The substrate treating apparatus includes a housing, a support member disposed within the housing to support the substrate, a supercritical fluid supply unit in which the supercritical fluid is stored, a supply tube connecting the supercritical fluid supply unit to the housing to adjust an amount of supercritical fluid supplied from the supercritical fluid supply unit into the housing, and a vent tube branched from the supply tube to discharge the supercritical fluid remaining in the supply tube. A switching valve opening or closing the vent tube is disposed in the vent tube.

First claim

What is claimed is:

1. An apparatus for treating a substrate using a supercritical fluid, the apparatus comprising:
a housing;
a support member disposed within the housing to support the substrate;
a supercritical fluid supply unit in which the supercritical fluid is stored;
a supply tube connecting the supercritical fluid supply unit to the housing; and
a vent tube branched from the supply tube to discharge the supercritical fluid remaining in the supply tube,
wherein a supply valve adjusting an amount of supercritical fluid supplied from the supercritical fluid supply unit into the housing is disposed in the supply tube,
wherein a switching valve opening or closing the vent tube is disposed in the vent tube.

2. The apparatus of claim 1 , wherein a flow rate adjustment member adjusting a flow rate of the supercritical fluid flowing into the vent tube is disposed in the vent tube.

3. The apparatus of claim 2 , wherein the flow rate adjustment member comprises a metering valve or an orifice.

4. The apparatus of claim 2 , wherein the flow rate adjustment member is disposed on a side opposite to a side at which the vent tube is connected to the supply tube with respect to the switching valve.

5. The apparatus of claim 1 , wherein the supply tube comprises:
a main tube having one end connected to the supercritical fluid supply unit;
an upper supply tube branched from a branch part disposed on the other end of the main tube, the upper supply tube being connected to an upper portion of the housing; and
a lower supply tube branched from the branch part, the lower supply tube being connected to a lower portion of the housing.

6. The apparatus of claim 5 , wherein the vent tube is branched from one point of the main tube, the upper supply tube, or the lower supply tube.

7. The apparatus of claim 6 , wherein the supply valve comprises a main valve, an upper valve, and a lower valve which are respectively disposed in the main tube, the upper supply tube, and the lower supply tube.

8. The apparatus of claim 7 , wherein the vent tube is branched between the branch part and the main valve, the upper valve, or the lower valve.

9. The apparatus of claim 7 , wherein a filter is disposed between the main valve and the branch part in the main tube.

10. The apparatus of claim 7 , further comprising a controller controlling the supply valve and the switching valve,
wherein the controller opens the switching valve in a state where the supply valve is closed to discharge the supercritical fluid remaining in the supply tube through the vent tube.

11. The apparatus of claim 1 , wherein the supply valve comprises a front valve adjacent to the supercritical fluid supply unit and a rear valve adjacent to the housing, and
the vent tube is branched between the front valve and the rear valve.

12. The apparatus of claim 11 , further comprising a controller controlling the supply valve and the switching valve,
wherein the controller opens the switching valve in a state where the supply valve is closed to discharge the supercritical fluid remaining in the supply tube through the vent tube.

13. A method for treating a substrate using the substrate treating apparatus of claim 1 , the method comprising:
opening the switching valve in a state where the supply valve is closed to discharge the supercritical fluid remaining the supply tube into the vent tube; and
closing the switching valve and opening the supply valve to supply the supercritical fluid into the housing.

14. The method of claim 13 , wherein, while the supercritical fluid is discharged into the vent tube, the substrate is unloaded from the housing or loaded into the housing.

15. A method for treating a substrate using the substrate treating apparatus of claim 1 , the method comprising:
when the substrate is completely dried, discharging the supercritical fluid remaining the supply tube while discharging the supercritical fluid within the housing in a state where introduction of the supercritical fluid from the supercritical fluid supply unit into the supply tube is blocked.

16. The method of claim 15 , wherein, when the substrate is loaded into the housing, the supercritical fluid remaining in the supply tube is discharged into the vent tube, and supply of the supercritical fluid from the supercritical fluid supply unit into the housing through the supply tube starts.

Assignees

• Semes Co Ltd

Inventors

• Kim Kibong
• Kim Boong
• Song Gil Hun
• Kwon Oh Jin

Classifications

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0408

  for drying · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• F26B21/37

  Velocity of flow; Quantity of flow · CPC title

• F26B21/40

  using gases other than air · CPC title