Liquid crystal display and manufacturing method thereof

Patent metadata

Field	Value
Publication number	US-9268164-B2
Application number	US-201414209263-A
Country	US
Kind code	B2
Filing date	Mar 13, 2014
Priority date	Mar 13, 2013
Publication date	Feb 23, 2016
Grant date	Feb 23, 2016

Abstract

A manufacturing method of a liquid crystal display includes: providing a pixel electrode on an insulation substrate; providing a sacrificial layer on the pixel electrode; providing a common electrode on the sacrificial layer; providing a photoresist layer on the common electrode; exposing a portion of the photoresist layer, common electrode and the sacrificial layer with light; developing the portion of the photoresist layer exposed with the light; etching a layer between the photoresist layer and the sacrificial layer using the developed photoresist layer as a mask to expose the portion of the sacrificial layer exposed with the light; removing the portion of the sacrificial layer exposed with the light; providing a roof layer on the insulation substrate and etching the roof layer to form a liquid crystal injection hole therein; and removing the sacrificial layer exposed through the liquid crystal injection hole to form a microcavity.

First claim

What is claimed is:

1. A method of manufacturing a liquid crystal display, the method comprising:
providing a pixel electrode on an insulation substrate;
providing a sacrificial layer on the pixel electrode;
providing a common electrode on the sacrificial layer;
providing a photoresist layer on the common electrode;
exposing a portion of the photoresist layer, common electrode and the sacrificial layer with light;
developing the portion of the photoresist layer exposed with the light;
etching a layer between the photoresist layer and the sacrificial layer using the developed photoresist layer as a mask to expose the portion of the sacrificial layer exposed with the light;
removing the portion of the sacrificial layer exposed with the light;
providing a roof layer on the insulation substrate and etching the roof layer to form a liquid crystal injection hole therein which exposes the sacrificial layer; and
removing the sacrificial layer exposed through the liquid crystal injection hole to form a microcavity.

2. The method of claim 1 , further comprising:
providing a lower insulating layer between the common electrode and the photoresist layer,
wherein the sacrificial layer, the common electrode and the photoresist layer cover the pixel electrode on the insulation substrate.

3. The method of claim 2 , wherein
the portion of the sacrificial layer exposed with the light corresponds to the liquid crystal injection hole and a column portion of the roof layer.

4. The method of claim 2 , wherein
the etching the layer between the photoresist layer and the sacrificial layer using the developed photoresist layer as a mask comprises:
etching the lower insulating layer using the developed photoresist layer as a mask;
removing the photoresist layer; and
etching the common electrode using the etched lower insulating layer as a mask to expose the portion of the sacrificial layer exposed with the light.

5. The method of claim 4 , further comprising:
providing an additional lower insulating layer on the insulation substrate, before the providing the roof layer on the insulation substrate and the etching the roof layer to form the liquid crystal injection hole therein, and after removing the portion of the sacrificial layer exposed with the light.

6. The method of claim 4 , wherein
the providing the roof layer on the insulation substrate and the etching the roof layer to form the liquid crystal injection hole therein comprises:
the providing the roof layer on the insulation substrate;
exposing a portion of the provided roof layer corresponding to the removed portion of the sacrificial layer with light;
developing the portion of the roof layer exposed with the light;
providing an upper insulating layer on the insulation substrate to cover the developed roof layer; and
removing a portion of the upper insulating layer corresponding to the removed portion of the sacrificial layer to form the liquid crystal injection hole.

7. The method of claim 1 , wherein
the etching the layer between the photoresist layer and the sacrificial layer using the developed photoresist layer as a mask comprises:
etching the common electrode using the developed photoresist layer as a mask to expose the portion of the sacrificial layer exposed with the light; and
removing the photoresist layer.

8. The method of claim 7 , wherein
the removing the photoresist layer comprises using an ashing process, and
the exposed portion of the sacrificial layer is partially removed by the ashing process.

9. The method of claim 8 , wherein
the removed portion of the sacrificial layer by the ashing process is positioned under the common electrode.

10. The method of claim 7 , further comprising:
providing an additional lower insulating layer on the insulation substrate, before the providing the roof layer on the insulation substrate and the etching the roof layer to form the liquid crystal injection hole therein, and after the removing the portion of the sacrificial layer exposed with the light.

11. The method of claim 7 , wherein
the providing the roof layer on the insulation substrate and the etching the roof layer to form the liquid crystal injection hole therein comprises:
the providing the roof layer on the insulation substrate;
exposing a portion of the provided roof layer corresponding to the removed portion of the sacrificial layer with light;
developing the portion of the roof layer exposed with the light;
providing an upper insulating layer on the insulation substrate to cover the developed roof layer; and
removing a portion of the upper insulating layer corresponding to the removed portion of the sacrificial layer to form the liquid crystal injection hole.

12. The method of claim 7 , wherein
the exposed portion of the sacrificial layer corresponds to the liquid crystal injection hole and a column portion of the roof layer.

Assignees

• Samsung Display Co Ltd

Inventors

• Lim Tae Woo
• Chae Kyung Tae
• Won Sung Hwan
• Lee Seon Uk
• Lee Jun Heui

Classifications

• G02F1/133377 Primary

  Cells with plural compartments or having plurality of liquid crystal microcells partitioned by walls, e.g. one microcell per pixel · CPC title

• G02F1/1343

  Electrodes {(reflective electrodes G02F1/133553)} · CPC title

• G02F1/1341 Primary

  Filling or closing of cells · CPC title

• G02F1/133345

  Insulating layers (G02F1/1335, G02F1/1337, G02F1/135, G02F1/136 take precedence) · CPC title

• G02F1/134309

  characterised by their geometrical arrangement · CPC title