Observation and analysis unit

Patent metadata

Field	Value
Publication number	US-9268126-B2
Application number	US-201013395636-A
Country	US
Kind code	B2
Filing date	Aug 20, 2010
Priority date	Sep 18, 2009
Publication date	Feb 23, 2016
Grant date	Feb 23, 2016

Abstract

An observation and analysis unit that magnifies an image of a sample and further accomplishes the evaluation and analysis thereof. The observation and analysis unit includes a light-microscopic device designed for the magnified imaging and optical evaluation of the sample and a sample analyzer that analyzes selected regions of the sample. The sample analyzer includes an electron source from which an electron beam can be directed to a region of the sample selected by use of the light-microscopic device. The sample analyzer further includes an X-ray detector designed to detect X-ray radiation generated by the interaction of the electron beam with the sample material. The unit further includes an actuation and evaluation unit that generates control commands for the light-microscopic device and the electron source and spectrally analyzes the X-ray radiation.

First claim

What is claimed is:

1. An observation and analysis unit, comprising:
a light-microscopical device, designed for magnified imaging and optical evaluation of a sample;
an analyzer that analyzes selected regions of the sample including:
an electron beam source that directs an electron beam to a region of the sample selected by application of the light-microscopical device;
an X-ray detector, that detects X-ray radiation generated by interaction of the electron beam with material of the sample;
an actuation and evaluation unit, that generates control commands for the light-microscopical device, the electron source and/or a sample positioning structure, and that spectrally analyzes the X-ray radiation;
a shielding that prevents propagation of the X-ray radiation that is hazardous to persons, wherein the shielding encloses the electron beam source, the X-ray detector, and the sample;
a structure for feeding a non-air gas to a space between the sample and the electron beam source within the shielding;

wherein the sample is surrounded by a gas below or near atmospheric pressure, during analysis by application of the electron beam source and the X-ray detector; and
the light-microscopical unit further comprising a revolving objective nosepiece, wherein the electron source is integrated into the revolving objective nosepiece.

2. The observation and analysis unit as claimed in claim 1 , further comprising a control device that moves the sample relative to an observation ray path of the light-microscopical unit, the electron beam and/or the X-ray detector.

3. The observation and analysis unit as claimed in claim 2 , in which the control device is operably connected with the actuation and evaluation unit.

4. The observation and analysis unit as claimed in claim 1 , wherein the non-air gas comprises helium.

5. The observation and analysis unit as claimed in claim 1 wherein the shielding is gas-tight.

6. The observation and analysis unit as claimed in claim 5 , wherein the non-air gas comprises helium.

7. The observation and analysis unit as claimed in claim 1 , further comprising an electron beam focuser that focuses the electron beam on the selected region of the sample.

8. The observation and analysis unit as claimed in claim 1 , further comprising a tubule between the electron beam source and the sample, through which tubule the electron beam is directed to the sample.

9. The observation and analysis unit as claimed in claim 8 , further comprising structure that varies a distance between the sample and an electron beam outlet port at the tubule.

10. The observation and analysis unit as claimed in claim 1 , further comprising a shutter or filter, which, at least when the electron beam source is switched on, blocks a ray path of the light-microscopical unit to X-ray radiation, so that danger from the X-ray radiation during visual observation of the sample is inhibited.

11. The observation and analysis unit as claimed in claim 1 , further comprising an electron beam aligner that aligns the electron beam relative to the sample by directing a light beam in a visible wavelength range directed substantially parallel to a direction of the electron beam.

12. The observation and analysis unit as claimed in claim 11 , wherein the light beam comprises a laser beam.

13. The observation and analysis unit as claimed in claim 1 , further comprising an exchanger holding at least one microscope objective allocatable to the light-microscopical unit, the electron source, the X-ray detector or both the electron source and the X-ray detector.

14. The observation and analysis unit as claimed in claim 1 , wherein an area for visual observation of the sample with the light-microscopical unit and an area for analysis of the sample with the electron beam and the X-ray detector are located separately from one another.

15. The observation and analysis unit as claimed in claim 14 , wherein the X-ray detector is fitted in a revolving objective nosepiece.

16. The light microscope as claimed in claim 1 , wherein the X-ray detector is fitted in the revolving objective nosepiece.

17. A light microscope, comprising:
an electron beam source from which, in addition to or as an alternative to an illumination ray path coming from a light microscope objective, an electron beam is directed at a sample;
an X-ray detector which receives X-ray radiation generated by interaction of the electron beam with the sample;
an evaluation device that is operably coupled to the X-ray detector and spectrally analyzes the X-ray radiation;
a shielding that prevents propagation of the X-ray radiation that is hazardous to person, wherein the shielding encloses the electron beam source, the X-ray detector, and the sample;
a structure for feeding a non-air gas to a space between the sample and the electron beam source within the shielding; and
a revolving objective nosepiece, wherein the electron source is integrated into the revolving objective nosepiece;
wherein the sample is surrounded by a gas below or near atmospheric pressure, during analysis by application of the electron beam source and the X-ray detector.

Assignees

• Edelmann Martin
• Thomas Christian
• Zeiss Carl Microscopy Gmbh

Inventors

• Edelmann Martin
• Thomas Christian

Classifications

• G02B21/367 Primary

  providing an output produced by processing a plurality of individual source images, e.g. image tiling, montage, composite images, depth sectioning, image comparison · CPC title

• G01N23/2252

  Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA] · CPC title

• H01J37/165

  Means associated with the vessel for preventing the generation of or for shielding unwanted radiation, e.g. X-rays · CPC title

• H01J37/228

  whereby illumination or light collection take place in the same area of the discharge · CPC title