Chlorotrifluoroethylene copolymer

US9266986B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9266986-B2
Application numberUS-57806605-A
CountryUS
Kind codeB2
Filing dateApr 13, 2005
Priority dateApr 13, 2004
Publication dateFeb 23, 2016
Grant dateFeb 23, 2016

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Abstract

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The present invention provides a chlorotrifluoroethylene copolymer endowed with stress cracking resistance, chemical resistance and thermal stability. The present invention is a chlorotrifluoroethylene copolymer constituted of chlorotrifluoroethylene unit, tetrafluoroethylene unit and a monomer [A] unit derived from a monomer [A] copolymerizable with chlorotrifluoroethylene and tetrafluoroethylene, wherein the sum of chlorotrifluoroethylene unit and the tetrafluoroethylene unit amounts to 90 to 99.9 mole percent and the monomer [A] unit amounts to 0.1 to 10 mole percent.

First claim

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The invention claimed is: 1. A chlorotrifluoroethylene copolymer constituted which consists of chlorotrifluoroethylene unit, tetrafluoroethylene unit and a monomer (A) unit derived from a monomer (A) copolymerizable with chlorotrifluoroethylene and tetrafluoroethylene, wherein the sum of said chlorotrifluoroethylene unit and said tetrafluoroethylene unit amounts to 90 to 99.9 mole % and said monomer (A) unit amounts to 0.1 to 10 mole %, when the monomer (A) is a PAVE, the monomer (A) unit amounts to not less than 0.5 mole %, wherein the chlorotrifluoroethylene unit amounts to 12.6 to 62.5 mole % of the sum of said chlorotrifluoroethylene unit and the tetrafluoroethylene unit, wherein the temperature (Tx) required for causing decomposition of 1% by mass of said chlorotrifluoroethylene copolymer is not lower than 370° C., wherein said chlorotrifluoroethylene copolymer has a melting point (Tm) of 150 to 300° C., and wherein the monomer (A) is at least one monomer selected from the group consisting of ethylene, vinylidene fluoride, a perfluoro(alkyl vinyl ether) and a vinyl monomer represented by the general formula (I): CX 3 X 4 ═CX 1 (CF 2 ) n -X 2   (I) wherein X 1 , X 3 and X 4 are the same or different and each represents hydrogen atom or fluorine atom, X 2 represents hydrogen atom, fluorine atom or chlorine atom and n represents an integer of 1 to 10. 2. The chlorotrifluoroethylene copolymer according to claim 1 , wherein the monomer (A) is a perfluoro(alkyl vinyl ether) represented by the general formula (II): CF 2 ═CF—ORf 1   (II) wherein Rf 1 represents a perfluoroalkyl group containing 1 to 8 carbon atoms. 3. The chlorotrifluoroethylene copolymer according to claim 1 , wherein the chlorotrifluoroethylene unit amounts to 15 to 55 mole % of the sum of said chlorotrifluoroethylene unit and the tetrafluoroethylene unit. 4. The chlorotrifluoroethylene copolymer according to claim 1 , which has a melt flow rate of 0.1 to 70 g/10 minutes. 5. A molded article obtained by using the chlorotrifluoroethylene copolymer according to claim 1 . 6. The molded article according to claim 5 which is a fluid transfer member. 7. The chlorotrifluoroethylene copolymer according to claim 1 , wherein the sum of said chlorotrifluoroethylene unit and said tetrafluoroethylene unit amounts to 90 to 98.6 mole % and said monomer (A) unit amounts to 1.4 to 10 mole %. 8. The chlorotrifluoroethylene copolymer according to claim 1 , wherein the sum of said chlorotrifluoroethylene unit and said tetrafluoroethylene unit amounts to 90 to 98.6 mole % and said monomer (A) unit amounts to 1.4 to 10 mole %.

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What does patent US9266986B2 cover?
The present invention provides a chlorotrifluoroethylene copolymer endowed with stress cracking resistance, chemical resistance and thermal stability. The present invention is a chlorotrifluoroethylene copolymer constituted of chlorotrifluoroethylene unit, tetrafluoroethylene unit and a monomer [A] unit derived from a monomer [A] copolymerizable with chlorotrifluoroethylene and tetrafluoroethyl…
Who is the assignee on this patent?
Shimono Takeshi, Aoyama Takahisa, Torimae Hiroshi, and 2 more
What technology area does this patent fall under?
Primary CPC classification C08F214/24. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 23 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).