High throughput heated ion implantation system and method
US-2015380285-A1 · Dec 31, 2015 · US
US9263307B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9263307-B2 |
| Application number | US-201213485300-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 31, 2012 |
| Priority date | May 31, 2011 |
| Publication date | Feb 16, 2016 |
| Grant date | Feb 16, 2016 |
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Provided are an apparatus and method for treating a substrate, and more particularly, to a substrate treatment apparatus having a cluster structure and a substrate treatment method using the same. The apparatus for treating the substrate includes a load port on which a container for receiving the substrate is placed, a treatment module for treating the substrate, and a transfer module including a robot for transferring the substrate between the container and the treatment module. The treatment module includes a transfer chamber including a robot for transferring the substrate, a load lock chamber disposed between the transfer chamber and the transfer module, a first treatment chamber disposed spaced from the transfer module around the transfer chamber to perform a first treatment process, and a second treatment chamber disposed around the transfer chamber to perform a second treatment process.
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What is claimed is: 1. An apparatus for treating a substrate, the apparatus comprising: a load port on which a container for receiving the substrate is placed; a treatment module for treating the substrate; and a transfer module comprising a robot for transferring the substrate between the container and the treatment module; wherein the treatment module comprises: a transfer chamber comprising a robot for transferring the substrate, a load lock chamber disposed between th…
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