Apparatus and method for treating substrate

US9263307B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9263307-B2
Application numberUS-201213485300-A
CountryUS
Kind codeB2
Filing dateMay 31, 2012
Priority dateMay 31, 2011
Publication dateFeb 16, 2016
Grant dateFeb 16, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are an apparatus and method for treating a substrate, and more particularly, to a substrate treatment apparatus having a cluster structure and a substrate treatment method using the same. The apparatus for treating the substrate includes a load port on which a container for receiving the substrate is placed, a treatment module for treating the substrate, and a transfer module including a robot for transferring the substrate between the container and the treatment module. The treatment module includes a transfer chamber including a robot for transferring the substrate, a load lock chamber disposed between the transfer chamber and the transfer module, a first treatment chamber disposed spaced from the transfer module around the transfer chamber to perform a first treatment process, and a second treatment chamber disposed around the transfer chamber to perform a second treatment process.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus for treating a substrate, the apparatus comprising: a load port on which a container for receiving the substrate is placed; a treatment module for treating the substrate; and a transfer module comprising a robot for transferring the substrate between the container and the treatment module; wherein the treatment module comprises: a transfer chamber comprising a robot for transferring the substrate, a load lock chamber disposed between th…

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What does patent US9263307B2 cover?
Provided are an apparatus and method for treating a substrate, and more particularly, to a substrate treatment apparatus having a cluster structure and a substrate treatment method using the same. The apparatus for treating the substrate includes a load port on which a container for receiving the substrate is placed, a treatment module for treating the substrate, and a transfer module including…
Who is the assignee on this patent?
Kim Hyung Joon, Semes Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/0466. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 16 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).