Photoresist application

Patent metadata

Field	Value
Publication number	US-9261791-B2
Application number	US-201313833480-A
Country	US
Kind code	B2
Filing date	Mar 15, 2013
Priority date	Mar 15, 2013
Publication date	Feb 16, 2016
Grant date	Feb 16, 2016

Abstract

Devices and methods are provided where photoresist is applied on a substrate and at least some regions of the photoresist are dried prior to removing a substrate from a substrate support.

First claim

What is claimed is:

1. A device comprising:
a substrate support;
a photoresist application device, wherein in operation the photoresist application devices applies photoresist on a substrate on the substrate support;
a drying device, wherein in operation the drying device dries at least regions of the photoresist on the substrate while the substrate is on the substrate support; and
a gripping device, wherein in operation the gripping device after application of the photoresist grips the substrate only after drying by the drying device at the dried regions and removes the substrate from the substrate support while a peripheral portion of the substrate remains coated with the photoresist applied by the photoresist application device.

2. The device of claim 1 , wherein the substrate support is rotatable.

3. The device of claim 2 , wherein the photoresist application device comprises a nozzle to apply photoresist to the substrate.

4. The device of claim 1 , wherein the drying device comprises a radiation emitting device.

5. The device of claim 4 , wherein the radiation emitting device comprises an infrared lamp.

6. The device of claim 4 , wherein the radiation emitting device is sized to irradiate a spot on the substrate.

7. The device of claim 4 , wherein the radiation emitting device is postionable to irradiate a peripheral part including the peripheral portion of the substrate.

8. The device of claim 4 , wherein the radiation emitting device irradiates the substrate essentially over a complete width of the substrate.

9. The device of claim 4 , wherein the radiation emitting device emits radiation with a wavelength outside a photosensitivity range of the photoresist.

10. A device comprising:
a rotatable substrate support;
a nozzle, wherein in operation the nozzle applies photoresist on a substrate on the substrate support;
an infrared lamp, wherein in operation the infrared lamp irradiates at least part of the substrate on the substrate support with infrared radiation; and
a gripping device, wherein in operation the gripping device after application of the photoresist by the nozzle grips the substrate only after irradiating by the infrared lamp and removes the substrate from the substrate support by gripping the substrate on an irradiated portion of the photoresist while a peripheral portion of the substrate remains coated with the photoresist applied by the nozzle.

11. The device of claim 10 , wherein the infrared lamp is movable.

12. The device of claim 10 , wherein the infrared lamp extends across the substrate support.

13. The device of claim 10 , wherein the substrate support comprises a chuck.

14. The device of claim 10 , wherein the infrared lamp is positionable above a peripheral region including the peripheral portion of the substrate.

15. A method comprising:
placing a substrate on a substrate support;
applying photoresist on the substrate while the substrate is on the substrate support;
drying at least regions of the photoresist while the photoresist is on the substrate; and
removing the substrate from the substrate support by gripping the substrate at the dried regions of the photoresist while a peripheral portion of the substrate remains coated with the applied photoresist, wherein after applying the photoresist, gripping of the substrate occurs only after drying.

16. The method of claim 15 , wherein the drying comprises irradiating the photoresist.

17. The method of claim 16 , wherein the irradiating comprises irradiating with a wavelength outside a photosensitivity range of the photoresist.

18. The method of claim 15 , wherein the drying comprises drying the photoresist essentially over a complete surface of the substrate.

19. A method for manufacturing a device comprising:
providing a substrate support;
providing a photoresist application device, wherein in operation the photoresist application device applies photoresist on a substrate on the substrate support;
providing a drying device, wherein in operation the drying device dries at least regions of the photoresist on the substrate while the substrate is on the substrate support; and
providing a gripping device, wherein in operation the gripping device after application of the photoresist grips the substrate at the at least dried regions of the photoresist only after drying by the drying device while a peripheral portion of the substrate remains coated with the photoresist applied by the photoresist application device.

20. The method of claim 19 , wherein providing the drying device comprises providing a radiation emitting device.

21. The method of claim 20 , wherein providing the radiation emitting device comprises providing an infrared lamp.

Assignees

• Infineon Technologies Ag

Inventors

• Walter Thomas
• Behrendt Andreas

Classifications

• G03F7/162

  Coating on a rotating support, e.g. using a whirler or a spinner · CPC title

• G03F7/168 Primary

  Finishing the coated layer, e.g. drying, baking, soaking · CPC title