Lithographic method and apparatus

Patent metadata

Field	Value
Publication number	US-9261402-B2
Application number	US-201313849333-A
Country	US
Kind code	B2
Filing date	Mar 22, 2013
Priority date	Apr 16, 2012
Publication date	Feb 16, 2016
Grant date	Feb 16, 2016

Abstract

A method and apparatus are provided for determining apodization properties of a projection system in a lithographic apparatus. The method comprises allowing light from a given point in an illumination field to pass through the projection system along at least three different optical paths, and then determining the difference in the intensity of light received in a projection field from the two different optical paths, and calculating apodization properties of the projection system from the intensity difference. It is not necessary to know the intensity distribution in the illumination field. To provide the different optical paths a pinhole reticle provided with wedges of different orientations is used.

First claim

What is claimed is:

1. A method of determining apodization properties of an optical system comprising an illumination system and a projection system, the method comprising:
allowing light from a given point in an illumination field to pass through the projection system along at least a first optical path, a second optical path and a third optical path;
determining a first difference in intensity of light received in a projection field from the first optical path and the second optical path;
determining a second difference in intensity of light received in the projection field from the first optical path and the third optical path; and
calculating apodization properties of the projection system from the first difference in intensity of light and the second difference in intensity of light.

2. The method of claim 1 , wherein light is allowed to pass through the projection system from a plurality of points disposed in a first direction perpendicular to the optical axis of the system.

3. The method of claim 1 , wherein the at least first optical path, second optical path and third optical path are created by interposing optical elements between the illumination system and the projection system.

4. The method of claim 3 , wherein the optical elements comprise optical wedges with different orientations.

5. The method of claim 3 , wherein the optical elements comprise blazed gratings.

6. The method of claim 1 , comprising:
interposing between the illumination system and the projection system a substrate comprising an array of pinholes, at least some of the pinholes being covered by an optical wedge and forming a wedge/pinhole pair; and
successively illuminating the wedge/pinhole pairs.

7. The method of claim 6 , wherein the array comprises a first number of pairs in a first direction and a second number of pairs in a second direction, wherein in a row of pairs in the second direction the orientation of the wedge differs in each pair.

8. The method of claim 7 , wherein in the array a row of pairs in the second direction comprises four pinhole/wedge pairs.

9. The method of claim 8 , wherein in a row of pairs in the second direction the wedges are orientated at 90° intervals relative to each other.

10. The method of claim 1 , wherein the optical system is part of a lithographic apparatus.

11. An apparatus for determining apodization properties of an optical system comprising an illumination system and a projection system, the apparatus comprising:
an optical source configured to generate a beam of radiation to pass through the optical system;
a substrate disposed in an illumination field and configured to pass light through the projection system along at least a first optical path, a second optical path and a third optical path;
a sensing module configured to detect the light received in a projection; and
a computing device configured to:
determine a first difference in intensity of light received in a projection field from the first optical path and the second optical path,
determine a second difference in intensity of light received in the projection field from the first optical path and the third optical path, and
calculate apodization properties of the projection system from the first difference in intensity of light and the second difference in intensity of light.

12. The apparatus of claim 11 , wherein the substrate further comprises an optical element provided between the illumination system and the projection system.

13. The apparatus of claim 12 , wherein the optical element comprises optical wedges.

14. The apparatus of claim 12 , wherein the optical element comprises blazed gratings.

15. The apparatus of claim 12 , wherein the substrate comprises an array of pinholes with each pinhole having an associated optical wedge forming a pinhole/wedge pair.

16. The apparatus of claim 15 , wherein the array comprises a first number of the pairs in a first direction and a second number of pairs in a second direction, wherein in a row of pairs in the second direction the orientation of the wedge differs in each pair.

17. The apparatus of claim 16 , wherein in the array a row of pairs in the second direction comprises four pinhole/wedge pairs.

18. The apparatus of claim 17 , wherein in a row of pairs in the second direction the wedges are orientated at 90° intervals relative to each other.

19. The apparatus of claim 11 , wherein the sensing module includes a camera.

20. The apparatus of claim 11 , wherein the optical system is part of a lithographic apparatus.

21. The apparatus of claim 11 , wherein the substrate is further configured to shift along a plane parallel with the substrate such that shifting of the substrate causes the light to pass through a given pinhole of a plurality of pinholes in the substrate to form either the first optical path, the second optical path or the third optical path.

22. The method of claim 1 , further comprising shifting a substrate along a plane parallel with the substrate such that shifting of the substrate causes the light to pass through a given pinhole of a plurality of pinholes in the substrate to form either the first optical path, the second optical path or the third optical path.

Assignees

• Asml Netherlands Bv

Inventors

• Baselmans Johannes Jacobus Matheus

Classifications

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G01J1/42 Primary

  using electric radiation detectors (optical or mechanical part G01J1/04; by comparison with a reference light or electric value G01J1/10) · CPC title

• G03F7/70941

  Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss · CPC title

• G03F7/70591 Primary

  Testing optical components · CPC title