Color filter substrate, manufacturing method thereof and display device

Patent metadata

Field	Value
Publication number	US-9256012-B2
Application number	US-201314350914-A
Country	US
Kind code	B2
Filing date	Dec 12, 2013
Priority date	May 15, 2013
Publication date	Feb 9, 2016
Grant date	Feb 9, 2016

Abstract

A color filter substrate, a manufacturing method thereof and a display device are provided. The color filter substrate includes a substrate; a black matrix dividing the substrate into a plurality of sub-pixel areas arranged in matrix; a color filter layer including color photoresist patterns with N different colors, N≧3, arranged cyclically in discontinuous sub-pixel areas in adjacent N rows/columns, the color photoresist patterns in M adjacent sub-pixel areas of a single color in at least one line/column in the color filter layer extending to regions over the black matrix corresponding to regions between adjacent sub-pixel areas, to form continuous strip-like color photoresist patterns, wherein M≧2; and spacers including main spacers disposed over regions between adjacent discontinuous color photoresist patterns corresponding to the black matrix and secondary spacers disposed over regions of the continuous strip-like color photoresist patterns corresponding to the black matrix.

First claim

What is claimed is:

1. A color filter substrate, comprising:
a substrate;
a black matrix dividing the substrate into a plurality of sub-pixel areas arranged in matrix;
a color filter layer including color photoresist patterns with N different colors, N≧3, arranged cyclically in discontinuous sub-pixel areas in adjacent N rows/columns, the color photoresist patterns in M adjacent sub-pixel areas of a single color in at least one line/column in the color filter layer extending to regions over the black matrix corresponding to regions between adjacent sub-pixel areas, to form continuous strip-like color photoresist patterns, wherein M≧2; and
spacers including main spacers disposed over regions between adjacent discontinuous color photoresist patterns corresponding to the black matrix and secondary spacers disposed over regions of the continuous strip-like color photoresist patterns corresponding to the black matrix.

2. The color filter substrate according to claim 1 , wherein the N=3, the color photoresist patterns of different colors comprise red photoresist patterns, green photoresist patterns and blue photoresist patterns cyclically arranged in rows/columns; or
the N=4, the color photoresist patterns of different colors include red photoresist patterns, green photoresist patterns, blue photoresist patterns and yellow photoresist patterns cyclically arranged in rows/columns.

3. The color filter substrate according to claim 2 , wherein the secondary spacers are formed by a material which is identical to that is used for forming the color photoresist patterns while or after forming the continuous strip-like color photoresist patterns.

4. The color filter substrate according to claim 2 , wherein the color filter substrate further comprises a protective layer disposed over the black matrix, the secondary spacers and the color filter layer, and the main spacers are disposed over the protective layer.

5. The color filter substrate according to claim 1 , wherein the secondary spacers are formed by a material which is identical to that is used for forming color photoresist patterns while or after forming the continuous strip-like color photoresist patterns.

6. The color filter substrate according to claim 1 , wherein the color filter substrate further comprises a protective layer disposed over the black matrix, the secondary spacers and the color filter layer, and the main spacers are disposed over the protective layer.

7. A display device comprising the color filter substrate according to claim 1 .

8. A method of manufacturing a color filter substrate, comprising:
forming a black matrix over a substrate, which divides the substrate into a plurality of sub-pixel areas arranged in matrix;
forming a color filter layer over the substrate, including cyclically disposing color photoresist patterns of N different colors in discontinuous sub-pixel areas in adjacent N rows/columns, N≧3, and forming continuous strip-like color photoresist patterns extending to regions over the black matrix; and
forming spacers including main spacers and secondary spacers over the substrate, the main spacers formed over regions between adjacent discontinuous color photoresist patterns corresponding to the black matrix, and the secondary spacers formed over regions of the continuous strip-like color photoresist patterns corresponding to the black matrix, the secondary spacers being formed in a same photolithographic process with the color photoresist patterns of a N th color.

9. The method according to claim 8 , wherein step of forming the secondary spacers in a same photolithographic process with the color photoresist patterns of a N th color comprises:
Step S 1 : forming a layer of color resin material for forming color photoresist patterns of the N th color over the substrate with color photoresist patterns of N−1 colors already formed;
Step S 2 : exposing the substrate having gone through step S 1 with a mask provided with patterns corresponding to that for forming secondary spacers and color photoresist patterns of the N th color; and
Step S 3 : developing the substrate having gone through step S 2 , and forming the secondary spacers and the color photoresist patterns of the N th color at the same time.

10. The method according to claim 9 , wherein in the step S 1 , step of forming color photoresist patterns of N−1 colors comprises: forming color photoresist patterns of a first to a N−1 th colors by N−1 photolithographic processes respectively in the arrangement direction of the color photoresist patterns, the color photoresist patterns in M neighbor sub-pixel areas of at least one row/column of a single color in the color filter layer extending to regions over the black matrix between corresponding adjacent sub-pixel areas, to form continuous strip-like color photoresist patterns, wherein M≧2.

11. The method according to claim 10 , wherein the color photoresist patterns of the N th color is made of a color resin material containing a light sensitive composition, and in step S 2 , regions in the mask corresponding to formation of secondary spacers are designed as regions keeping resin material.

12. The method according to claim 11 , further comprising a step of forming a protective layer formed over the black matrix, the secondary spacers and the color filter layer, wherein the main spacers are formed over the protective layer.

13. The method according to claim 9 , wherein the color photoresist patterns of the N th color is made of a color resin material containing a light sensitive composition, and in step S 2 , regions in the mask corresponding to the formation of the secondary spacers are designed as regions keeping resin material.

14. The method according to claim 13 , further comprising a step of forming a protective layer formed over the black matrix, the secondary spacers and the color filter layer, wherein the main spacers are formed over the protective layer.

15. The method according to claim 13 , wherein the N=3, the color photoresist patterns of different colors comprise red photoresist patterns, green photoresist patterns and blue photoresist patterns cyclically arranged in rows/columns; or
the N=4, the color photoresist patterns of different colors comprise red photoresist patterns, green photoresist patterns, blue photoresist patterns and yellow photoresist patterns cyclically arranged in rows/columns.

16. The method according to claim 9 , further comprising a step of forming a protective layer formed over the black matrix, the secondary spacers and the color filter layer, wherein the main spacers are formed over the protective layer.

17. The method according to claim 10 , further comprising a step of forming a protective layer formed over the black matrix, the secondary spacers and the color filter layer, wherein the main spacers are formed over the protective layer.

18. The method according to claim 10 , wherein the N=3, the color photoresist patterns of different colors comprise red photoresist patterns, green photoresist patterns and blue photoresist patterns cyclically arranged in rows/columns; or
the N=4, the color photoresist patterns of different colors comprise red photoresist patterns, green photoresist patterns, blue photoresist patterns and yellow photoresist patterns cyclically arranged in rows/columns.

19. The method according to claim 8 , further comprising a step of forming a protective layer formed over the black matrix, the secondary spacers and the color filter layer, wherein the main spacers are formed over the protective

Assignees

• Boe Technology Group Co Ltd
• Beijing Boe Display Tech Co

Inventors

• Li Min
• Jiang Jingjing
• Yang Tonghua
• Huang Changgang

Classifications

• G02B5/201 Primary

  in the form of arrays · CPC title

• G02F1/13394

  spacers regularly patterned on the cell subtrate, e.g. walls, pillars (G02F1/133377 takes precedence) · CPC title

• G02F1/133512

  Light shielding layers, e.g. black matrix (G02F1/136209 takes precedence) · CPC title

• G02F1/133514

  Colour filters · CPC title

• G02F1/13396

  Spacers having different sizes · CPC title