Acid generators and photoresists comprising same
US-9499513-B2 · Nov 22, 2016 · US
Photoacid generators and photoresists comprising same
US9255079B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9255079-B2 |
| Application number | US-96536810-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 10, 2010 |
| Priority date | Dec 10, 2009 |
| Publication date | Feb 9, 2016 |
| Grant date | Feb 9, 2016 |
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- Title
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Abstract
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New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for producing a sulfonium compound associated with a fluorinated sulfonic acid, the method comprising cyclizing an alkylthio compound in the presence of a fluorinated sulfonic acid. 2. The method of claim 1 wherein the alkylthio compound has a formula of R—S(CH 2 ) n (CH 2 LG) where: R is a non-hydrogen substitutent; n is an integer of from 3 to 6; and LG is a leaving group. 3. The method of claim 1 wherein the fluorinated sulfonic acid has a formula of R(CH 2 ) n (CF 2 ) 2 SO 3 — where n is an integer of from 2 to 8, and R is a non-hydrogen substitutent. 4. The method of claim 1 wherein a photoacid generator compound is produced that is selected from the following Formulae (I) and (II): wherein in each of Formulae I and II R is hydrogen or a non-hydrogen substituent such a straight, branched or cyclic C 1-20 alkyl groups. 5. The method of claim 4 wherein R is tert-butyl.
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Classifications
Spiro-condensed systems · CPC title
with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title
the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title
- C07D333/46Primary
substituted on the ring sulfur atom · CPC title
not covered by C07J31/003 · CPC title
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Frequently asked questions
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- What does patent US9255079B2 cover?
- New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.
- Who is the assignee on this patent?
- Li Mingqi, Aqad Emad, Liu Cong, and 4 more
- What technology area does this patent fall under?
- Primary CPC classification C07D333/46. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Feb 09 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).