Method for producing catalytic metal layer and method for producing graphene material

US9254477B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9254477-B2
Application numberUS-201414468663-A
CountryUS
Kind codeB2
Filing dateAug 26, 2014
Priority dateFeb 27, 2012
Publication dateFeb 9, 2016
Grant dateFeb 9, 2016

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  1. Title

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A rectangular substrate 12 composed of c-plane sapphire is prepared. Nickel serving as a catalytic metal is deposited on the entirety of an upper surface of the substrate 12 to form a catalytic metal film 14 (see (a)). The catalytic metal film 14 is patterned by a lithography method into a catalytic metal film 16 having a predetermined shape (see (b)). The temperature of the catalytic metal film 16 is raised to 1000° C. and maintained at 1000° C. for 20 minutes. The temperature of the catalytic metal film 16 is lowered from 1000° C. to 800° C. at a rate of 5° C./min. The temperature of the catalytic metal film 16 is maintained at 800° C. for 15 hours. Thereby, a catalytic metal layer 17 having large grains is provided (see (c)).

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing a catalytic metal layer, comprising the steps of: (a) forming a film composed of a catalytic metal on a substrate, the catalytic metal having the function of promoting graphenization; (b) raising the temperature of the catalytic metal to a heating temperature in a high-temperature region where a high affinity between the catalytic metal and the substrate is achieved; (c) lowering the temperature of the catalytic metal from th…

Assignees

Inventors

Classifications

  • Operations & Transport · mapped topic

  • Operations & Transport · mapped topic

  • B01J23/755Primary

    Operations & Transport · mapped topic

  • Operations & Transport · mapped topic

  • Operations & Transport · mapped topic

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What does patent US9254477B2 cover?
A rectangular substrate 12 composed of c-plane sapphire is prepared. Nickel serving as a catalytic metal is deposited on the entirety of an upper surface of the substrate 12 to form a catalytic metal film 14 (see (a)). The catalytic metal film 14 is patterned by a lithography method into a catalytic metal film 16 having a predetermined shape (see (b)). The temperature of the catalytic…
Who is the assignee on this patent?
Univ Meijo
What technology area does this patent fall under?
Primary CPC classification B01J23/755. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Feb 09 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).