OVJP for printing graded/stepped organic layers

US9252397B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9252397-B2
Application numberUS-201313761883-A
CountryUS
Kind codeB2
Filing dateFeb 7, 2013
Priority dateFeb 7, 2013
Publication dateFeb 2, 2016
Grant dateFeb 2, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An emissive layer deposited in graded manner using a plurality of nozzles is disclosed. A mixtures ejected from the plurality of nozzles may contain varying concentrations of host-to-dopant material. The nozzles, as disclosed, may be arranged in a sequential manner such that the order of the sequence is based on varying concentration of the host-to-dopant material. The nozzles may be configured to translate relative to an area of a substrate to allow sequential deposition.

First claim

Opening claim text (preview).

The invention claimed is: 1. A device comprising: a first nozzle configured to eject a first mixture over a first region of a substrate, the first mixture comprising a host and an organic dopant; and a second nozzle configured to eject a second mixture over the first region of the substrate, the second mixture comprising the host and the organic dopant; wherein the device is configured to create the first and second mixtures, with the first mixture comprising a different ratio of host to organic dopant than the second mixture, and wherein the first and second nozzles deposit graded organic layers from the first and second mixtures, where each layer is deposited by a different nozzle and each layer contains substantially the same amount of total host and dopant material, but the ratios and components of the organic material vary from one layer to another. 2. The device of claim 1 , wherein the plurality of nozzles are configured to eject a mixture in a sequential order. 3. The device of claim 2 , wherein the sequential order is based on the host-to-dopant ratio of the mixture in each nozzle. 4. The device of claim 3 , wherein the sequential order is based on a highest to lowest concentration of host-to-dopant ratio of the mixture in each nozzle. 5. The device of claim 1 , wherein the plurality of nozzles are configured to translate relative to an area of a substrate. 6. The device of claim 1 , wherein the host comprises a plurality of host materials. 7. The device of claim 1 , wherein the dopant comprises a primary organic dopant and a co-dopant. 8. The device of claim 1 , wherein the organic dopant comprises a plurality of co-dopant materials. 9. The device of claim 1 , wherein the first mixture comprises a carrier gas. 10. The device of claim 1 , further comprising: a first mixture source of the mixture, in fluid communication with the first nozzle; and a second mixture source of the second mixture, in fluid communication with the second mixture. 11. The device of claim 10 , further comprising: a third mixture source of a third mixture; and a third nozzle in fluid communication with the third mixture source, and configured to eject the third mixture over the substrate. 12. The device of claim 11 , wherein the third mixture comprises the host and the organic dopant, at a different ratio of the host to the organic dopant than each of the first and second mixtures. 13. The device of claim 11 , wherein the third mixture comprises the host and a different organic dopant than the first and second mixtures. 14. The device of claim 11 , wherein the third mixture comprises a different host than the first and second mixtures, and a different organic dopant than the first and second mixtures. 15. The device of claim 1 , wherein the device is configured to create the first and second mixtures such that the device receives the host, mixes the host with a first concentration of the organic dopant to form the first mixture, and mixes the host with a second concentration of the organic dopant to form the second mixture.

Assignees

Inventors

Classifications

  • Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

  • C23C14/24Primary

    Vacuum evaporation · CPC title

  • Electricity · mapped topic

  • Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks · CPC title

  • H01L51/56Primary

    Electricity · mapped topic

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What does patent US9252397B2 cover?
An emissive layer deposited in graded manner using a plurality of nozzles is disclosed. A mixtures ejected from the plurality of nozzles may contain varying concentrations of host-to-dopant material. The nozzles, as disclosed, may be arranged in a sequential manner such that the order of the sequence is based on varying concentration of the host-to-dopant material. The nozzles may be configured…
Who is the assignee on this patent?
Harikrishna Mohan Siddharth, Burrows Paul E, Universal Display Corp
What technology area does this patent fall under?
Primary CPC classification C23C14/24. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 02 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).