Magnetoresistive element

US9252357B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9252357-B2
Application numberUS-201514628932-A
CountryUS
Kind codeB2
Filing dateFeb 23, 2015
Priority dateMar 21, 2013
Publication dateFeb 2, 2016
Grant dateFeb 2, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

According to one embodiment, a magnetoresistive element comprises a storage layer having perpendicular magnetic anisotropy with respect to a film plane and having a variable direction of magnetization, a reference layer having perpendicular magnetic anisotropy with respect to the film plane and having an invariable direction of magnetization, a tunnel barrier layer formed between the storage layer and the reference layer and containing O, and an underlayer formed on a side of the storage layer opposite to the tunnel barrier layer. The reference layer comprises a first reference layer formed on the tunnel barrier layer side and a second reference layer formed opposite the tunnel barrier layer. The second reference layer has a higher standard electrode potential than the underlayer.

First claim

Opening claim text (preview).

What is claimed is: 1. A magnetic random access memory comprising: a first nonmagnetic layer containing at least one of Hf, Ta, Nb, Al, and Ti; a first magnetic layer provided on the first nonmagnetic layer and containing a magnetic material; a second nonmagnetic layer provided on the first magnetic layer and containing O; a second magnetic layer provided on the second nonmagnetic layer and containing the magnetic material, the magnetic material in the second magnetic layer and the magnetic material in the first magnetic layer being same in concentration; and a third magnetic layer provided on the second magnetic layer and including Pt or Pd. 2. The memory of claim 1 , wherein the first magnetic layer constitutes a storage layer. 3. The memory of claim 2 , wherein the storage layer has perpendicular magnetic anisotropy with respect to a film plane, and has a variable direction of magnetization. 4. The memory of claim 1 , wherein the second and third magnetic layers constitute a reference layer. 5. The memory of claim 4 , wherein the reference layer has perpendicular magnetic anisotropy with respect to a film plane, and has an invariable direction of magnetization. 6. The memory of claim 1 , wherein the second nonmagnetic layer constitutes a tunnel barrier layer. 7. The memory of claim 1 , wherein an O concentration in the second nonmagnetic layer is higher on the first magnetic layer side than on the second magnetic layer side. 8. The memory of claim 1 , wherein the first nonmagnetic layer has a greater film thickness than the first magnetic layer. 9. The memory of claim 1 , wherein the second nonmagnetic layer contains MgO, Al 2 O 3 , MgAlO, ZnO, or TiO. 10. The memory of claim 1 , wherein the magnetic material in the first magnetic layer and the magnetic material in the second magnetic layer contain Co or Fe. 11. The memory of claim 1 , wherein the third magnetic layer has a greater film thickness than the second magnetic layer. 12. The memory of claim 1 , further comprising first and second electrodes, wherein the first nonmagnetic layer is provided on the first electrode, and the second electrode is provided on the third magnetic layer. 13. The memory of claim 1 , further comprising a fourth magnetic layer provided on the third magnetic layer. 14. The memory of claim 13 , wherein the fourth magnetic layer constitutes a shift cancelling layer. 15. The memory of claim 13 , further comprising a third nonmagnetic layer provided between the third and fourth magnetic layers. 16. The memory of claim 15 , wherein the third nonmagnetic layer contains a conductive material. 17. The memory of claim 16 , wherein the conductive material comprises Ru. 18. The memory of claim 1 , wherein the first nonmagnetic layer further contains at least one of O and N.

Assignees

Inventors

Classifications

  • Electricity · mapped topic

  • Electricity · mapped topic

  • G11C11/161Primary

    details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell · CPC title

  • Electricity · mapped topic

  • H01L43/10Primary

    Electricity · mapped topic

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What does patent US9252357B2 cover?
According to one embodiment, a magnetoresistive element comprises a storage layer having perpendicular magnetic anisotropy with respect to a film plane and having a variable direction of magnetization, a reference layer having perpendicular magnetic anisotropy with respect to the film plane and having an invariable direction of magnetization, a tunnel barrier layer formed between the storage la…
Who is the assignee on this patent?
Toshiba Kk
What technology area does this patent fall under?
Primary CPC classification G11C11/161. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 02 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).