Magnetic head manufacturing method forming sensor side wall film by over-etching magnetic shield
US-9196268-B2 · Nov 24, 2015 · US
US9251815B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9251815-B2 |
| Application number | US-201313930150-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 28, 2013 |
| Priority date | Jun 28, 2013 |
| Publication date | Feb 2, 2016 |
| Grant date | Feb 2, 2016 |
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An apparatus disclosed herein includes a sensor stack including a first layer and an AFM stabilized bottom shield in proximity to the first layer, wherein the AFM stabilized bottom shield is magnetically coupled to the first layer. The apparatus reduces shield-to-shield spacing. The pinned layer of the bottom shield and a pinned layer of the sensor stack are stabilized using the AFM layer in the bottom shield. In one implementation, the bottom shield is made of the SAF structure, with the top layer of the structure adjacent to a pinned layer in the sensor stack.
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What is claimed is: 1. An apparatus comprising: a sensor stack including a pinned layer; and an AFM stabilized bottom shield formed adjacent to the pinned layer of the sensor stack, wherein the AFM stabilized bottom shield is magnetically coupled to the pinned layer of the sensor stack and the AFM stabilized bottom shield includes a top layer of a SAF structure in proximity to the pinned layer of the sensor stack, and a pinned layer of the SAF structure. 2.…
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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