Ni-base dual multi-phase intermetallic compound alloy containing Nb and C, and manufacturing method for same

US9249488B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9249488-B2
Application numberUS-201113636579-A
CountryUS
Kind codeB2
Filing dateMar 25, 2011
Priority dateMar 26, 2010
Publication dateFeb 2, 2016
Grant dateFeb 2, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present invention provides an Ni-base dual multi-phase intermetallic compound alloy which has a dual multi-phase microstructure comprising a primary precipitate L1 2 phase and an (L1 2 +D0 22 ) eutectoid microstructure, and which comprises: more than 5 atomic % and up to 13 atomic % of Al; at least 9.5 atomic % and less than 17.5 atomic % of V; more than 0 atomic % and up to 12.5 atomic % of Nb; more than 0 atomic % and up to 12.5 atomic % of C; and a remainder comprising Ni.

First claim

Opening claim text (preview).

The invention claimed is: 1. An Ni-base intermetallic compound alloy, which comprises a dual multi-phase microstructure comprising a primary precipitate L1 2 phase and an (L1 2 +D0 22 ) eutectoid microstructure, and which comprises: more than 5 atomic % and up to 13 atomic % of Al; at least 9.5 atomic % and less than 17.5 atomic % of V; from 3.1 atomic % to 5.3 atomic % of Nb; from 0.2 atomic % to 2.4 atomic % of C; and a remainder comprising Ni. 2.…

Assignees

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Classifications

  • C22F1/10Primary

    Chemistry & Metallurgy · mapped topic

  • Chemistry & Metallurgy · mapped topic

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What does patent US9249488B2 cover?
The present invention provides an Ni-base dual multi-phase intermetallic compound alloy which has a dual multi-phase microstructure comprising a primary precipitate L1 2 phase and an (L1 2 +D0 22 ) eutectoid microstructure, and which comprises: more than 5 atomic % and up to 13 atomic % of Al; at least 9.5 atomic % and less than 17.5 atomic % of V; more than 0 atomic % and up to 12.5 atomic % …
Who is the assignee on this patent?
Takasugi Takayuki, Kaneno Yasuyuki, Univ Osaka Prefect Public Corp
What technology area does this patent fall under?
Primary CPC classification C22F1/10. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 02 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).