Surface-micromachined micro-magnetic undulator

Patent metadata

Field	Value
Publication number	US-9247630-B2
Application number	US-201214355127-A
Country	US
Kind code	B2
Filing date	Nov 9, 2012
Priority date	Nov 11, 2011
Publication date	Jan 26, 2016
Grant date	Jan 26, 2016

Abstract

Various embodiments of undulators, methods of fabricating undulators, and systems incorporating undulators are described. Certain embodiments provide a compact, electromagnetic undulator. The undulator may comprise a substrate and one or more electromagnets, which may be formed on the substrate. Certain embodiments have a period not greater than about 5 mm. The undulator may be operatively coupled with a particle accelerator to provide a free electron laser system.

First claim

What is claimed is:

1. An electromagnetic undulator, comprising:
a substrate;

an electromagnetic structure formed on the substrate,
the electromagnetic structure having at least a yoke and a first plurality of yoke poles integral to the yoke; and
selectively powerable windings around each yoke pole in the first plurality of yoke poles enabling a winding drive current for each yoke pole in the first plurality of yoke poles to be independently tuned,
wherein yoke poles in the first plurality of yoke poles are magnetized in-plane with the substrate,
wherein the electromagnetic undulator has a period not greater than about 5 mm and not less than about 5 μm.

2. The electromagnetic undulator as defined in claim 1 , wherein the yoke has a thickness and a yoke gap, wherein the ratio of the yoke gap to the yoke thickness is less than or equal to 10:1.

3. The electromagnetic undulator as defined in claim 1 , wherein the electromagnetic undulator has a period in the range of about 10 μm to about 100 μm.

4. The electromagnetic undulator as defined in claim 1 , wherein the electromagnetic undulator has a period in the range of about 300 μm to about 400 μm.

5. The electromagnetic undulator as defined in claim 1 , wherein the electromagnetic undulator has a period in the range of about 400 μm to about 800 μm.

6. The electromagnetic undulator as defined in claim 1 , wherein the independently controllable windings are metal windings.

7. The electromagnetic undulator as defined in claim 1 , further comprising surface-micromachined solenoidal soft micro-magnets.

8. The electromagnetic undulator as defined in claim 1 , wherein the electromagnetic undulator has an optical wavelength and output power tunable over a plurality of orders of magnitude by selectively changing drive current in one or more of the independently controllable windings.

9. The electromagnetic undulator as defined in claim 1 , wherein the electromagnetic undulator is configured to generate a magnetic flux on only one side of an undulator axis.

10. The electromagnetic undulator as defined in claim 1 , wherein the electromagnetic undulator does not require cryogenic cooling for operation.

11. A method of fabricating an electromagnetic undulator, the method comprising:
defining a pattern for bottom coil windings on a substrate;
depositing an insulating layer over the substrate;
depositing a seed layer;
electroplating a magnetic alloy layer over the seed layer to form an electromagnetic yoke;
forming a photoresist layer over the electromagnetic yoke;
patterning the photoresist layer to define coil winding interconnects; and
electroplating metal over the coil winding interconnects to form, at least in part, a plurality of selectively powerable bottom coil windings.

12. The method as defined in claim 11 , the method further comprising using a damascene process in forming the plurality of individually controllable bottom coil windings.

13. The method as defined in claim 11 , the method further comprising stripping at least a portion of the seed layer.

14. The method as defined in claim 11 , wherein the seed layer comprises copper and titanium.

15. The method as defined in claim 11 , wherein the magnetic alloy comprises NiFe, CoNiFe, or CoNiP.

16. The method as defined in claim 11 , wherein the electromagnetic undulator has a period in the range of about 5 μm to about 5 mm.

17. The method as defined in claim 11 , wherein the electromagnetic yoke has an associated gap in the range of about 10 μm-400 μm across.

18. A free electron laser system, comprising:
a particle accelerator;
an electromagnetic undulator in operative arrangement with the particle accelerator, the electromagnetic undulator comprising:
a substrate;
an electromagnetic structure formed on the substrate,

the electromagnetic structure having at least a yoke and a first plurality of yoke poles integral to the yoke; and
selectively powerable windings around each yoke pole in the first plurality of yoke poles enabling a winding drive current for each yoke pole in the first plurality of yoke poles to be independently tuned,
wherein yoke poles in the first plurality of yoke poles are magnetized in-plane with the substrate,
wherein the electromagnetic undulator has a period not greater than about 5 mm and not less than about 5 μm.

19. The free electron laser system as defined in claim 18 , wherein the particle accelerator has a length in the range of 2 cm to 10 cm.

20. The free electron laser system as defined in claim 18 , wherein the particle accelerator has an output no greater than 500 MeV.

21. The free electron laser system as defined in claim 18 , wherein the particle accelerator is a laser-plasma Wakefield accelerator.

Assignees

• Univ California

Inventors

• Harrison Jere
• Joshi Abhijeet

Classifications

• H01S1/005

  using a relativistic beam of charged particles, e.g. electron cyclotron maser, gyrotron · CPC title

• H01F7/06

  Electromagnets; Actuators including electromagnets {(electric coils H01F5/00; devices for holding workpieces using electric force B23Q3/15; load-engaging elements for lifting articles electromagnetically B66C1/06; electromagnetic couplings F16D27/00; magnetic brakes F16D63/002; electromagnetically operated valves F16K11/24, F16K31/00; analysing materials by magnetic means G01N27/72, G01N27/80; electromagnets for winding mechanical clocks G04C1/02; electromagnetic relays H01H51/00; windings for salient poles of dynamo-electric machines H02K3/18; electromagnets for telegraphic communication H04L; for arc lamps H05B31/28)} · CPC title

• H01S3/0959

  by an electron beam · CPC title

• H05H7/04 Primary

  Magnet systems {, e.g. undulators, wigglers (free-electron laser H01S3/0903)}; Energisation thereof · CPC title

• H01S3/0903

  Free-electron laser · CPC title