Process for synthesis of hybrid siloxy derived resins and crosslinked networks therefrom

US9246173B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9246173-B2
Application numberUS-201314083165-A
CountryUS
Kind codeB2
Filing dateNov 18, 2013
Priority dateNov 16, 2012
Publication dateJan 26, 2016
Grant dateJan 26, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A hybrid siloxy derived resin and a method of making them and a method of applying them as a benign passivant on electrochemical electrodes is provided. These resins are made by the process of reacting a silane and an alkaline, transition metal or metalloid alkoxide, in the presence of a lewis acid. The methods described do not require further purification steps; heat; or strong acid/base catalysis to initiate hydrolysis.

First claim

Opening claim text (preview).

The invention claimed is: 1. A siloxy resin made by a process comprising reacting (i) a hydridosilane or a hydridosiloxane and (ii) a compound comprising at least one selected from the group consisting of an alkaline earth metal alkoxide, a transition metal alkoxide, or a metalloid alkoxide, in the presence of a Lewis acid. 2. The siloxy resin of claim 1 , wherein the compound comprises an alkaline earth metal alkoxide. 3. The siloxy resin of claim 1 , wherein the compound comprises a transition metal alkoxide. 4. The siloxy resin of claim 1 , wherein the compound comprises a metalloid alkoxide. 5. The siloxy resin of claim 1 , wherein the siloxy resin produced is cross-linked. 6. The siloxy resin of claim 5 , wherein the siloxy resin produced is ternary cross-linked or cross-linked in a network. 7. The siloxy resin of claim 4 , wherein the metalloid alkoxide is alkoxyborane. 8. The siloxy resin of claim 7 , wherein a stoichiometric Si:B ratio of the siloxy resin produced is between 500:1 and 1:100. 9. The siloxy resin of claim 4 , wherein the metalloid alkoxide is at least one selected from the group consisting of where R 1 is alkyl or aryl; R 2 is alkyl, aryl, C 1 -C 20 aliphatic radical, cycloaliphatic radical, aromatic radical, allylic radical, arylaliphatic radical or substituted aliphatic, cycloaliphatic or arylaliphatic radical in which substituted groups are selected from the group consisting of heteroatoms, methyl, ethyl, isopropyl, allyl, methallyl, benzyl, morpholyl, and methylthioethyl. 10. The siloxy resin of claim 9 , wherein R 1 is methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, or tert-butyl. 11. The siloxy resin of claim 1 , wherein the hydridosilane or hydridosiloxane is represented by at least one of the following structures (VII)-(XVIII): where R 2 , R 2′ and R 2′″ are each independently linear or branched alkyl, aryl, C 1 -C 20 aliphatic radical, cycloaliphatic radical, aromatic radical, allylic radical, arylaliphatic radical or substituted aliphatic, cycloaliphatic or arylaliphatic radical in which substituted groups are selected from the group consisting of heteroatoms, methyl, ethyl, isopropyl, allyl, methallyl, benzyl, morpholyl, and methylthioethyl, a is an integer from 1 to 8, b is an integer from 1 to 10,000, and c is an integer from 0 to 15,000, wherein the sum of b+c is in the range of 2 to 20,000 inclusive. 12. A method for producing the siloxy resin of claim 1 comprising reacting (i) a hydridosilane or a hydridosiloxane and (ii) a compound comprising at least one selected from the group consisting of an alkaline earth metal alkoxide, a transition metal alkoxide, or a metalloid alkoxide in the presence of a Lewis acid, to obtain the siloxy resin. 13. The method of claim 12 , wherein the compound comprises an alkaline earth metal alkoxide. 14. The method of claim 12 , wherein the compound comprises a transition metal alkoxide. 15. The method of claim 12 , wherein the compound comprises a metalloid alkoxide. 16. The siloxy resin of claim 1 , wherein the reaction is conducted at room temperature. 17. The siloxy resin of claim 1 , wherein no product purification steps are required, and said products are directly applied to fabrication processes. 18. A method of applying the siloxy resin of claim 1 to a negative electrode comprising an electrochemical cell. 19. A method comprising applying the siloxy resin of claim 1 to a positive electrode of an electrochemical cell. 20. A barrier film comprising the siloxy resin of claim 1 . 21. An energy storage device, comprising a Li doped borosiloxane, wherein the borosiloxane comprises a siloxy resin made by a process comprising reacting (i) a hydridosilane or a hydridosiloxane and (ii) a compound comprising a metalloid alkoxide, in the presence of a Lewis acid. 22. A conformal passivant or thin film coating on a photoluminescent down-converted phosphor for a light emitting diode, the conformal passivant or thin film comprising a siloxy resin made by a process comprising reacting (i) a hydridosilane or a hydridosiloxane and (ii) a compound comprising at least one selected from the group consisting of an alkaline earth metal, a transition metal or a metalloid alkoxide, in the presence of a Lewis acid.

Assignees

Inventors

Classifications

  • characterised by the catalysts used · CPC title

  • Polysiloxanes · CPC title

  • a linkage containing boron · CPC title

  • H01M4/628Primary

    Inhibitors, e.g. gassing inhibitors, corrosion inhibitors · CPC title

  • Compositions for anticorrosive coatings · CPC title

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What does patent US9246173B2 cover?
A hybrid siloxy derived resin and a method of making them and a method of applying them as a benign passivant on electrochemical electrodes is provided. These resins are made by the process of reacting a silane and an alkaline, transition metal or metalloid alkoxide, in the presence of a lewis acid. The methods described do not require further purification steps; heat; or strong acid/base catal…
Who is the assignee on this patent?
Mitsubishi Chem Corp
What technology area does this patent fall under?
Primary CPC classification H01M4/628. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 26 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).