Infiltration compositions for PCD by using coated carbide substrates

US9242215B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9242215-B2
Application numberUS-201213598893-A
CountryUS
Kind codeB2
Filing dateAug 30, 2012
Priority dateAug 30, 2012
Publication dateJan 26, 2016
Grant dateJan 26, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A polycrystalline diamond compact made from a high pressure, high temperature process is provided. The compact includes a metal carbide substrate including a binder and at least one inner layer of polycrystalline diamond disposed on the substrate. The polycrystalline diamond has a diamond phase and a metal phase forming an interconnected mutually exclusive network. The metal phase is a material different than that of the binder of the substrate to provide improved diamond sintering and final polycrystalline diamond compact properties. Prior to processing at least one coating is disposed on the substrate, and the layer of diamond particles is disposed on the at least one coating. During the high pressure, high temperature process the coating melts and fully sweeps into the diamond layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A polycrystalline diamond compact made from a high pressure, high temperature process, the compact comprising: a metal carbide substrate including a binder; at least one inner layer of polycrystalline diamond disposed on said substrate at an interface, said polycrystalline diamond layer having a diamond phase and a metal phase forming an interconnected mutually exclusive network, wherein said metal phase is a material different than the binder of said substrate to provide improved diamond sintering and final polycrystalline diamond compact properties, wherein the metal phase is distributed in the polycrystalline diamond layer in a composition gradient, the composition gradient extending from the interface toward an outer surface of the polycrystalline diamond layer, and wherein the metal phase comprises zirconium. 2. The polycrystalline diamond compact of claim 1 , wherein the metal phase is distributed in the polycrystalline diamond layer in a composition gradient, the composition gradient extending from the interface toward an outer surface of the polycrystalline diamond layer. 3. The polycrystalline diamond compact of claim 1 , wherein the metal phase of said polycrystalline diamond layer is an alloy. 4. The polycrystalline diamond compact of claim 1 , wherein the metal phase of said polycrystalline diamond layer is a mixture of cobalt and at least one other element. 5. The polycrystalline diamond compact of claim 4 , wherein the element is selected from the group of silicon, boron, zirconium, aluminum, ruthenium, chromium, manganese, molybdenum, platinum, palladium and mixtures of such. 6. The polycrystalline diamond compact of claim 1 , wherein the metal phase is provided by at least one coating disposed on said substrate prior to the high temperature, high pressure process that has melted and swept into the diamond phase. 7. The polycrystalline diamond compact of claim 6 , wherein the metal phase has a melting point lower than a melting point of the binder of said substrate. 8. The polycrystalline diamond compact of claim 1 , wherein the metal phase determines the composition of the polycrystalline diamond layer. 9. The polycrystalline diamond compact of claim 1 , wherein said substrate is cobalt bonded cemented tungsten carbide. 10. The polycrystalline diamond compact of claim 1 , further comprising a blocking layer disposed on said substrate for preventing sweeping of the binder from said substrate into the polycrystalline diamond layer. 11. The polycrystalline diamond compact of claim 10 , wherein said blocking layer is a coating of material selected from the group of titanium, carbides or nitrides thereof, or a combination thereof. 12. The polycrystalline diamond compact of claim 1 , wherein the metal phase includes a plurality of alloys, each of the plurality of alloys having a melting point lower than the binder of the substrate. 13. A polycrystalline diamond compact made from a high pressure, high temperature process, the compact comprising: a metal carbide substrate including a binder; at least one inner layer of polycrystalline diamond disposed on said substrate at an interface, said polycrystalline diamond layer having a diamond phase and a metal phase forming an interconnected mutually exclusive network, wherein said metal phase is a material different than the binder of said substrate to provide improved diamond sintering and final polycrystalline diamond compact properties, wherein the metal phase is distributed in the polycrystalline diamond layer in a composition gradient, the composition gradient extending from the interface toward an outer surface of the polycrystalline diamond layer, and wherein the metal phase includes a plurality of alloys, each of the plurality of alloys having a melting point lower than the binder of the substrate. 14. The polycrystalline diamond compact of claim 13 , wherein the metal phase is distributed in the polycrystalline diamond layer in a composition gradient, the composition gradient extending from the interface toward an outer surface of the polycrystalline diamond layer. 15. The polycrystalline diamond compact of claim 13 , wherein the metal phase of said polycrystalline diamond layer is an alloy. 16. The polycrystalline diamond compact of claim 13 , wherein the metal phase of said polycrystalline diamond layer is a mixture of cobalt and at least one other element. 17. The polycrystalline diamond compact of claim 16 , wherein the element is selected from the group of silicon, boron, zirconium, aluminum, ruthenium, chromium, manganese, molybdenum, platinum, palladium and mixtures of such. 18. The polycrystalline diamond compact of claim 13 , wherein the metal phase is provided by at least one coating disposed on said substrate prior to the high temperature, high pressure process that has melted and swept into the diamond phase. 19. The polycrystalline diamond compact of claim 13 , wherein the metal phase determines the composition of the polycrystalline diamond layer. 20. The polycrystalline diamond compact of claim 13 , wherein said substrate is cobalt bonded cemented tungsten carbide. 21. The polycrystalline diamond compact of claim 13 , further comprising a blocking layer disposed on said substrate for preventing sweeping of the binder from said substrate into the polycrystalline diamond layer. 22. The polycrystalline diamond compact of claim 21 , wherein said blocking layer is a coating of material selected from the group of titanium, carbides or nitrides thereof, or a combination thereof.

Assignees

Inventors

Classifications

  • B24D99/005Primary

    Segments of abrasive wheels · CPC title

  • B01J3/06Primary

    Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies (B01J3/04 takes precedence) · CPC title

  • for porous or cellular structure, e.g. for use with diamonds as abrasives · CPC title

  • Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating · CPC title

  • Metallic interlayers · CPC title

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What does patent US9242215B2 cover?
A polycrystalline diamond compact made from a high pressure, high temperature process is provided. The compact includes a metal carbide substrate including a binder and at least one inner layer of polycrystalline diamond disposed on the substrate. The polycrystalline diamond has a diamond phase and a metal phase forming an interconnected mutually exclusive network. The metal phase is a material…
Who is the assignee on this patent?
Flood Gary, Suryavanshi Abhijit Prabhakar, Diamond Innovations Inc
What technology area does this patent fall under?
Primary CPC classification B24D99/005. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jan 26 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).