Articles comprising copolyesters produced with germanium catalyst
US-2024376258-A1 · Nov 14, 2024 · US
Methods for preparing polymers having low residual monomer content
US9242004B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9242004-B2 |
| Application number | US-201414286673-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 23, 2014 |
| Priority date | May 2, 2012 |
| Publication date | Jan 26, 2016 |
| Grant date | Jan 26, 2016 |
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Abstract
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Methods are provided for preparing polymer mixtures having low residual monomer content. The methods comprise mixing the at least two polymers in a solvent to form a polymeric mixture, the polymeric mixture comprising at least one residual monomer; and adding an antisolvent to the polymeric mixture so as to separate the at least two polymers from the polymeric mixture, where the residual monomer is soluble in the antisolvent. In some embodiments, methods are provided for preparing at least two polymers having low residual monomer content, the methods comprise adding an antisolvent to a mixture of at least two polymers dissolved in a solvent so as to precipitate the at least two polymers from the solvent and anti-solvent. The methods provided avoid steps in dry blending of polymers and produces polymer blends that have low residual monomer content.
First claim
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What is claimed is: 1. A method for preparing at least two polymers having a residual monomer content of less than 5%, the method comprising mixing the at least two polymers in a solvent to form a polymeric mixture, the at least two polymers having similar solubilities in the solvent, the polymeric mixture comprising at least one residual monomer and the polymeric mixture maintained at a pH in the range from 4-6, wherein the at least two polymers comprise a first polymer that is p…
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- What does patent US9242004B2 cover?
- Methods are provided for preparing polymer mixtures having low residual monomer content. The methods comprise mixing the at least two polymers in a solvent to form a polymeric mixture, the polymeric mixture comprising at least one residual monomer; and adding an antisolvent to the polymeric mixture so as to separate the at least two polymers from the polymeric mixture, where the residual monome…
- Who is the assignee on this patent?
- Warsaw Orthopedic Inc
- What technology area does this patent fall under?
- Primary CPC classification C08L67/04. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Jan 26 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).