Organoaminosilanes and methods for making same

Patent metadata

Field	Value
Publication number	US-9233990-B2
Application number	US-201514625158-A
Country	US
Kind code	B2
Filing date	Feb 18, 2015
Priority date	Feb 28, 2014
Publication date	Jan 12, 2016
Grant date	Jan 12, 2016

Abstract

Organoaminosilanes, such as without limitation di-iso-propylaminosilane (DIPAS), are precursors for the deposition of silicon containing films such as silicon-oxide and silicon-nitride films. Described herein are methods to make organoaminosilane compounds, or other compounds such as organoaminodisilanes and organoaminocarbosilanes, via the catalytic hydrosilylation of an imine by a silicon source comprising a hydridosilane.

First claim

The invention claimed is:

1. An organoaminocarbosilane compound represented by the following structures:

wherein R, R′ and R″ are each independently selected from hydrogen, a C 1-10 linear alkyl group, a C 3-10 branched alkyl group, a C 3-10 cyclic alkyl group, a C 2-10 alkenyl group, a C 4-10 aromatic group, a C 4-10 heterocyclic group, a C 1-10 linear organoamino group, a C 2-10 branched organoamino group, a silyl group, a C 1-10 linear carbosilyl group, and a C 2-10 branched carbosilyl group and wherein at least one of R′ and R″ or R and R′ or none of R′ and R″ or R and R′ are linked to form substituted or unsubstituted cyclic ring.

Assignees

• Air Prod & Chem

Inventors

• Xiao Manchao
• Macdonald Matthew R
• Ho Richard
• Lei Xinjian

Classifications

• C07F7/0801

  General processes · CPC title

• C07F7/10 Primary

  containing nitrogen {having a Si-N linkage} · CPC title

• C07F7/12

  Organo silicon halides · CPC title

• C07F7/025 Primary

  without C-silicon linkages · CPC title