Antimicrobial cleansing compositions

US9232790B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9232790-B2
Application numberUS-201113196313-A
CountryUS
Kind codeB2
Filing dateAug 2, 2011
Priority dateAug 2, 2011
Publication dateJan 12, 2016
Grant dateJan 12, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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Antimicrobial cleansing compositions are disclosed. The cleansing compositions include thin liquid/foaming compositions and gels. The antimicrobial cleansing compositions are effective antimicrobials and safe for everyday use.

First claim

Opening claim text (preview).

What is claimed is: 1. An antimicrobial cleansing composition comprising: a polar carrier solvent; from about 0.1% (w/w) to about 15% (w/w) cationic compatible surfactant; from about 0.01% (w/w) to about 10% (w/w) quaternary ammonium biocide; and a cationic compatible afterfeel agent, wherein the antimicrobial cleansing composition is substantially free of a betaine-based surfactant and substantially free of a compound selected from the group consisting of triclosan, triclocarban, a halogenated phenolic antimicrobial agent, and combinations thereof. 2. The antimicrobial cleansing composition of claim 1 , wherein the polar carrier solvent is selected from the group consisting of water, glycerin, propylene glycol, butylene glycol, polyethylene glycol, and combinations thereof. 3. The antimicrobial cleansing composition of claim 1 , wherein the cleansing composition comprises from about 60%(w/w) to about 95%(w/w) polar carrier solvent. 4. The antimicrobial cleansing composition of claim 1 , wherein the quaternary ammonium biocide is selected from the group consisting of benzalkonium chloride, benzethonium chloride, didecyldimonium chloride, dioctyldimonium chloride, and combinations thereof. 5. The antimicrobial cleansing composition of claim 1 , wherein the afterfeel agent is selected from the group consisting of di-PPG-2-myreth-10 adipate, polysilicone-20, polymethacrylamidopropyltrimonium chloride, polyquaternium-7, polyquaternium-15, polyquaternium-2, and combinations thereof. 6. The antimicrobial cleansing composition of claim 1 , wherein the cleansing composition comprises from about 0.1% (w/w) to about 5% (w/w) afterfeel agent. 7. The antimicrobial cleansing composition of claim 1 , wherein the cleansing composition is substantially free of a non-ionic surfactant. 8. The antimicrobial cleansing composition of claim 1 further comprising at least one of vitamins, botanical compounds, and moisturizers. 9. An antimicrobial cleansing gel composition comprising: a polar carrier solvent; from about 1.0% (w/w) to about 15% (w/w) cationic compatible surfactant; from about 0.01% (w/w) to about 10% (w/w) quaternary ammonium biocide; a cationic compatible afterfeel agent; and a cationic compatible thickening agent, wherein the antimicrobial cleansing gel composition is substantially free of a betaine-based surfactant and substantially free of a compound selected from the group consisting of triclosan, triclocarban, a halogenated phenolic antimicrobial agent, and combinations thereof. 10. The antimicrobial cleansing gel composition of claim 9 , wherein the polar carrier solvent is selected from the group consisting of water, glycerin, propylene glycol, butylene glycol, polyethylene glycol, and combinations thereof. 11. The antimicrobial cleansing gel composition of claim 9 , wherein the cleansing gel composition comprises from about 60% (w/w) to about 95% (w/w) polar carrier solvent. 12. The antimicrobial cleansing gel composition of claim 9 , wherein the quaternary ammonium biocide is selected from the group consisting of benzalkonium chloride, benzethonium chloride, didecyldimonium chloride, dioctyldimonium chloride, and combinations thereof. 13. The antimicrobial cleansing gel composition of claim 9 , wherein the afterfeel agent is selected from the group consisting of di-PPG-2-myreth-10 adipate, polysilicone-20, polymethacrylamidopropyltrimonium chloride, polyquaternium-7, polyquaternium-15, polyquaternium-2, and combinations thereof. 14. The antimicrobial cleansing gel composition of claim 9 , wherein the cleansing gel composition comprises from about 0.1% (w/w) to about 12% (w/w) afterfeel agent. 15. The antimicrobial cleansing gel composition of claim 9 , wherein the cationic compatible thickening agent is selected from the group consisting of a non-ionic thickening agent, a cationic thickening agent, a cationic compatible polymer, and combinations thereof. 16. The antimicrobial cleansing gel composition of claim 9 , wherein the cleansing gel composition is substantially free of a non-ionic surfactant. 17. The antimicrobial cleansing gel composition of claim 9 further comprising at least one of vitamins, botanical compounds, and moisturizers. 18. An antimicrobial cleansing composition comprising: a polar carrier solvent; from about 0.1% (w/w) to about 15% (w/w) cationic compatible surfactant; from about 0.01% (w/w) to about 10% (w/w) quaternary ammonium biocide; a cationic compatible afterfeel agent; and wherein the antimicrobial cleansing composition is completely free of a betaine-based surfactant and completely free of a compound selected from the group consisting of triclosan, triclocarban, a halogenated phenolic antimicrobial agent, and combinations thereof. 19. The antimicrobial cleansing composition of claim 18 , wherein the quaternary ammonium biocide is selected from the group consisting of benzalkonium chloride, benzethonium chloride, didecyldimonium chloride, dioctyldimonium chloride, and combinations thereof. 20. The antimicrobial cleansing composition of claim 18 , wherein the afterfeel agent is selected from the group consisting of di-PPG-2-myreth-10 adipate, polysilicone-20, polymethacrylamidopropyltrimonium chloride, polyquaternium-7, polyquaternium-15, polyquaternium-2, and combinations thereof. 21. An antimicrobial cleansing composition comprising: a polar carrier solvent; from about 0.1% (w/w) to about 15% (w/w) cationic compatible surfactant selected from the group consisting of amine oxide surfactants, cetrimonium chloride, stearalkonium chloride, behentrimonium methosulfate, isostearamidopropyl morpholine lactate, stearamidopropyl dimethylamine lactate, linoleamidopropyl PG dimonium chloride, undecyleneamidopropyltrimonium methosulfate, and salts thereof, and combinations thereof; from about 0.01% (w/w) to about 10% (w/w) quaternary ammonium biocide; and a cationic compatible afterfeel agent, wherein the antimicrobial cleansing composition is substantially free of a betaine-based surfactant and substantially free of a compound selected from the group consisting of triclosan, triclocarban, a halogenated phenolic antimicrobial agent, and combinations thereof. 22. The antimicrobial cleansing composition of claim 21 wherein the quaternary ammonium biocide is selected from the group consisting of benzalkonium chloride, benzethonium chloride, didecyldimonium chloride, dioctyldimonium chloride, and combinations thereof. 23. The antimicrobial cleansing composition of claim 21 wherein the amine oxide is selected from the group consisting of cocoamidopropylamine oxide and myristamine oxide.

Assignees

Inventors

Classifications

  • Combinations or mixtures of active ingredients covered by classes A01N27/00 - A01N65/48 with other active or formulation relevant ingredients, e.g. specific carrier materials or surfactants, covered by classes A01N25/00 - A01N65/48 · CPC title

  • characterised by the surfactants · CPC title

  • A01N33/12Primary

    Quaternary ammonium compounds · CPC title

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Frequently asked questions

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What does patent US9232790B2 cover?
Antimicrobial cleansing compositions are disclosed. The cleansing compositions include thin liquid/foaming compositions and gels. The antimicrobial cleansing compositions are effective antimicrobials and safe for everyday use.
Who is the assignee on this patent?
Moen Helen Kathleen, Cunningham Corey Thomas, Hoffman Douglas R, and 2 more
What technology area does this patent fall under?
Primary CPC classification A01N33/12. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Tue Jan 12 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).