Liquid composition, and resistor film, resistor element and circuit board using same

US9228100B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9228100-B2
Application numberUS-201113814293-A
CountryUS
Kind codeB2
Filing dateAug 4, 2011
Priority dateAug 6, 2010
Publication dateJan 5, 2016
Grant dateJan 5, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

There is provided a liquid composition that can form a resistor exhibiting a stable resistance value. One mode of the liquid composition of the invention is a liquid composition comprising (a) an epoxy resin, (b) carbon black particles, (c) carbon nanotubes and (d) a solvent with a vapor pressure of less than 1.34×10 3 Pa at 25° C.

First claim

Opening claim text (preview).

The invention claimed is: 1. A liquid composition comprising (a) an epoxy resin, (b) carbon black particles, (c) carbon nanotubes, the carbon nanotubes having an outer diameter of 3 nm or greater and a length greater than or equal to 100 nm and less than or equal to 15 μm, (d) a solvent with a vapor pressure of less than 1.34×10 3 Pa at 25° C., and (e) having a viscosity allowing for discharge from an ink-jet apparatus, wherein the content of the (c) carbon nanotubes is 0.1 to 10 parts by mass with respect to 100 parts by solid mass of the (b) carbon black particles. 2. The liquid composition according to claim 1 , wherein the mean dispersion particle size of the (b) carbon black particles is no greater than 500 nm, and the maximum dispersion particle size is no greater than 2 μm. 3. The liquid composition according to claim 1 , wherein the content of the (b) carbon black particles is 10 to 80 vol %, based on the total solid volume of the liquid composition. 4. The liquid composition according to claim 1 , wherein the viscosity is no greater than 50 mPa·s at 25° C. 5. The liquid composition according to claim 1 , wherein the (a) epoxy resin is a glycidyl etherified condensation product of a phenol and an aldehyde. 6. The liquid composition according to claim 1 , which further comprises (e) a curing agent, the (e) curing agent comprising the condensation product of a phenol and an aldehyde. 7. A resistor film formed by removing the solvent from the liquid composition according to claim 1 by heating. 8. A resistor element having the resistor film according to claim 7 . 9. A circuit board having the resistor element according to claim 8 formed on a substrate. 10. A resistor film formed by printing or coating the liquid composition according to claim 1 on a substrate to form a film of the liquid composition, and removing the solvent from the film of the liquid composition by heating. 11. A resistor element having the resistor film according to claim 10 . 12. A circuit board having the resistor element according to claim 11 formed on a substrate.

Assignees

Inventors

Classifications

  • Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins · CPC title

  • based on non-aqueous solvents · CPC title

  • Subject matter not provided for in other groups of this subclass · CPC title

  • characterised by the temporary binder · CPC title

  • Chemistry & Metallurgy · mapped topic

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Frequently asked questions

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What does patent US9228100B2 cover?
There is provided a liquid composition that can form a resistor exhibiting a stable resistance value. One mode of the liquid composition of the invention is a liquid composition comprising (a) an epoxy resin, (b) carbon black particles, (c) carbon nanotubes and (d) a solvent with a vapor pressure of less than 1.34×10 3 Pa at 25° C.
Who is the assignee on this patent?
Kumashiro Yasushi, Maruyama Naoki, Inada Maki, and 1 more
What technology area does this patent fall under?
Primary CPC classification C08K3/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 05 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).