Imprint lithography template

Patent metadata

Field	Value
Publication number	US-9227361-B2
Application number	US-201314026775-A
Country	US
Kind code	B2
Filing date	Sep 13, 2013
Priority date	Dec 10, 2009
Publication date	Jan 5, 2016
Grant date	Jan 5, 2016

Abstract

Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.

First claim

What is claimed is:

1. A method, comprising:
providing fluid in an inner channel of an imprint lithography template, the inner channel positioned adjacent to an active area of the template, the inner channel having an aperture and a port, the port constructed to provide the inner channel in fluid communication with a process gas supply and the aperture constructed to provide the inner channel in fluid communication with atmosphere adjacent to the second surface of the body; and,
confining the fluid between the active area of the template and a substrate positioned in superimposition with the template, wherein confining includes evacuating fluid through an outer channel, the outer channel positioned at a distance from the active area of the template, wherein the distance between the active area and the outer channel is constructed such that the outer channel evacuates fluid and simultaneously confines fluid within a circumference of the outer channel during an imprint lithography process.

2. The method of claim 1 , further comprising, directing fluid through an outer channel of the template to a waste container.

3. The method of claim 1 , further comprising, directing fluid through an outer channel of the template to atmospheric conditions.

4. The method of claim 1 , further comprising pulsing fluid through at least one hole positioned adjacent to the active area of the template.

5. The method of claim 1 , further comprising sequentially pulsing fluid through a first portion of holes and a second portion of holes positioned adjacent to the active area of the template.

6. The method of claim 1 , wherein providing fluid in an inner channel of an imprint lithography template further includes sequentially pulsing fluid through the inner channel and a first portion of holes positioned adjacent to the active area of the template.

7. The method of claim 6 , further comprising evacuating fluid through a second portion of holes positioned adjacent to the active area of the template.

8. The method of claim 1 , further comprising evacuating fluid through holes positioned adjacent to the active area of the template.

9. An imprint lithography method comprising:
providing an imprint lithography template, the imprint lithography template having
a body having a first surface and a second surface;
an active area positioned on the second surface of the body;
an inner channel positioned adjacent to the active area, the inner channel having an inner aperture and an inner port, the inner aperture forming an inner recessed region in the second surface of the body and the inner port extending from the aperture to the first surface of the body;
an outer channel positioned at a distance from the active area, the outer channel having an outer aperture and outer port, the aperture forming an outer recessed region in the second surface of the body surrounding the inner recessed region, and the outer port extending from the aperture to the first surface of the body;

positioning the imprint lithography template in superimposition with a substrate;
providing fluid through the inner channel to the active area of the template;
confining the fluid between the active area and the substrate, wherein the fluid is confined within a circumference of the outer channel; and,
evacuating the fluid through the outer channel while simultaneously confining fluid within a circumference of the outer channel.

10. The imprint lithography method of claim 9 , further comprising providing a process gas supply in fluid communication with the inner port of the inner channel for providing the fluid to the inner channel.

11. The imprint lithography method of claim 9 , further comprising providing a waste container in fluid communication with the outer port.

12. The imprint lithography method of claim 9 , wherein the outer port is in fluid communication with an external atmosphere.

13. An imprint lithography method comprising:
providing an imprint lithography template, the imprint lithography template having
a body having a first surface and a second surface;
an active area positioned on the second surface of the body;
a plurality of holes distributed around and surrounding the active area, each hole extending from the second surface of the body to the first surface of the body;

positioning the imprint lithography template in superimposition with a substrate;
providing fluid through the at least one of the plurality of holes to the active area of the template; and,
confining the fluid between the active area and the substrate.

14. The method of claim 13 further comprising pulsing fluid through at least one of the plurality of holes.

15. The imprint lithography method of claim 13 , further comprising evacuating the fluid through at least one of the plurality of holes.

16. The method of claim 13 further comprising sequentially pulsing the fluid through at least one of the plurality of holes and evacuating the fluid through at least one of the plurality of holes.

Assignees

• Molecular Imprints Inc
• Canon Nanotechnologies Inc

Inventors

• Choi Byung-Jin
• Choi Yeong-Jun
• Selinidis Kosta S
• Shackleton Steven C

Classifications

• B29C59/002 Primary

  Component parts, details or accessories; Auxiliary operations · CPC title

• B82Y10/00 Primary

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• H10P76/2041

  Photolithographic processes · CPC title