Method of forming macro-structured high surface area transparent conductive oxide electrodes

US9227224B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9227224-B2
Application numberUS-201213619053-A
CountryUS
Kind codeB2
Filing dateSep 14, 2012
Priority dateSep 15, 2011
Publication dateJan 5, 2016
Grant dateJan 5, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of forming a high surface area transparent conducting electrode is provided that includes depositing a transparent conducting thin film on a conductive substrate, where the transparent conducting thin film includes transparent conductive particles and a solution-based transparent conducting adhesive layer which serves to coat and bind together the transparent conducting particles, and heat treating the transparent conducting adhesion layer on the conductive substrate, where an increased surface area transparent conducting electrode is formed.

First claim

Opening claim text (preview).

What is claimed: 1. A method of forming a light scattering and intrapore mass transport structured transparent conducting electrode, comprising: a. depositing a single porous non-planar inorganic light scattering and intrapore mass transport structured transparent conducting thin film on a conductive substrate, wherein said intrapore mass transport structure is continuous throughout said transparent conducting thin film, wherein said single porous non-planar inorganic light scattering and intrapore mass transport structured transparent conducting thin film comprises transparent conductive inorganic particles coated with an inorganic sol-gel solution-based transparent conducting adhesive layer without an organic templating agent, wherein said inorganic sol-gel solution-based transparent conducting adhesive layer coats and binds together said inorganic transparent conducting particles, wherein a porosity of said porous non-planar inorganic transparent conducting thin film is formed that comprises an interconnected network of pores comprising periodic arrays of pores or disordered pores throughout said structure, wherein said pores comprise mesoscale pores or macroscale pores, wherein said mesoscale pores comprise pore sizes between 2-50 nm diameters, wherein said macroscale pores comprises pore sizes greater than 50 nm diameters that enable light scattering and intrapore mass transport; and b. heat treating said porous non-planar light scattering and intrapore mass transport structured inorganic transparent conducting adhesion layer on said inorganic conductive substrate, wherein an open porous non-planar inorganic transparent conducting electrode is formed that enables said light scattering and intrapore mass transport. 2. The method according to claim 1 , wherein said light scattering and intrapore mass transport structured transparent conducting thin film has a thickness in a range of a mono-layer of said particles to 10 4 layers of said particles. 3. The method according to claim 1 , wherein said light scattering and intrapore mass transport structured transparent conducting particles have a size in a range of 1 nm to 1 mm. 4. The method according to claim 1 , wherein said light scattering and intrapore mass transport structured transparent conducting electrode has a resistance in a range of 1-30 Ω sq −1 . 5. The method according to claim 1 , wherein said light scattering and intrapore mass transport structured transparent conducting electrode has roughness factor in a range of 1-140. 6. The method according to claim 1 , wherein said heat treating of said light scattering and intrapore mass transport structured transparent conducting electrode is comprises using a calcining process in i) air, ii) inert gas, or i) and ii). 7. The method according to claim 1 , wherein said substrate is selected from the group consisting of metal, carbon, conductive oxide and non-conductive material, wherein said non-conductive material comprises quartz. 8. The method according to claim 1 , wherein said light scattering and intrapore mass transport structured transparent conductive thin film is selected from the group consisting of indium tin oxide (ITO), fluorine doped tin oxide (FTO), Gallium zinc oxide, aluminum zinc oxide (AZO), and antimony tin oxide (ATO). 9. The method according to claim 1 , wherein said light scattering and intrapore mass transport structured transparent conducting particles are selected from the group consisting of indium tin oxide (ITO), fluorine doped tin oxide (FTO), Gallium zinc oxide, aluminum zinc oxide (AZO), and antimony tin oxide (ATO). 10. The method according to claim 1 , wherein said sol-gel solution-based transparent conducting adhesive layer comprises precursors selected from the group consisting of indium tin oxide (ITO), fluorine doped tin oxide (FTO), Gallium zinc oxide, aluminum zinc oxide (AZO), and antimony tin oxide (ATO).

Assignees

Inventors

Classifications

  • H10F71/138Primary

    Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes · CPC title

  • Electricity · mapped topic

  • involving particles, e.g. carbon nanotubes [CNT], flakes · CPC title

  • Photovoltaic [PV] energy · CPC title

  • B05D5/12Primary

    to obtain a coating with specific electrical properties · CPC title

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What does patent US9227224B2 cover?
A method of forming a high surface area transparent conducting electrode is provided that includes depositing a transparent conducting thin film on a conductive substrate, where the transparent conducting thin film includes transparent conductive particles and a solution-based transparent conducting adhesive layer which serves to coat and bind together the transparent conducting particles, and …
Who is the assignee on this patent?
Forman Arnold J, Chen Zhebo, Jaramillo Thomas F, and 1 more
What technology area does this patent fall under?
Primary CPC classification H10F71/138. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 05 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).