Method for manufacturing semiconductor device using oxide semiconductor

Patent metadata

Field	Value
Publication number	US-9224609-B2
Application number	US-95774610-A
Country	US
Kind code	B2
Filing date	Dec 1, 2010
Priority date	Dec 4, 2009
Publication date	Dec 29, 2015
Grant date	Dec 29, 2015

Abstract

A semiconductor device for high power application in which a novel semiconductor material having high mass productivity is provided. An oxide semiconductor film is formed, and then, first heat treatment is performed on the exposed oxide semiconductor film in order to reduce impurities such as moisture or hydrogen in the oxide semiconductor film. Next, in order to further reduce impurities such as moisture or hydrogen in the oxide semiconductor film, oxygen is added to the oxide semiconductor film by an ion implantation method, an ion doping method, or the like, and after that, second heat treatment is performed on the exposed oxide semiconductor film.

First claim

The invention claimed is:

1. A method for manufacturing a semiconductor device, comprising the steps of:
adding oxygen into an oxide semiconductor film;
performing a heat treatment on the oxide semiconductor film after the step of adding oxygen in a state where an entire top surface of the oxide semiconductor film is exposed; and
forming an insulating film in contact with the oxide semiconductor film after the step of adding oxygen and the step of performing the heat treatment,
wherein the step of adding oxygen is performed by an ion implantation method or an ion doping method.

2. The method for manufacturing a semiconductor device according to claim 1 , wherein the heat treatment is performed at a temperature higher than or equal to 300° C. and lower than or equal to 850° C.

3. The method for manufacturing a semiconductor device according to claim 1 , wherein the heat treatment is performed in air whose moisture content is less than or equal to 20 ppm.

4. The method for manufacturing a semiconductor device according to claim 1 , wherein a hydrogen concentration of the oxide semiconductor film is less than or equal to 5×10 19 /cm 3 .

5. The method for manufacturing a semiconductor device according to claim 1 , wherein the step of adding oxygen is performed by generating plasma, mass-separating ion species included in the plasma, and accelerating the ion species having predetermined mass.

6. A method for manufacturing a semiconductor device, comprising the steps of:
etching an oxide semiconductor film to form an island-shaped oxide semiconductor film;
adding oxygen into the island-shaped oxide semiconductor film;
performing a heat treatment on the island-shaped oxide semiconductor film after the step of adding oxygen in a state where an entire top surface of the oxide semiconductor film is exposed; and
forming an insulating film in contact with the island-shaped oxide semiconductor film after the step of adding oxygen and the step of performing the heat treatment,
wherein the step of adding oxygen is performed by an ion implantation method or an ion doping method.

7. The method for manufacturing a semiconductor device according to claim 6 , wherein the heat treatment is performed at a temperature higher than or equal to 300° C. and lower than or equal to 850° C.

8. The method for manufacturing a semiconductor device according to claim 6 , wherein the heat treatment is performed in air whose moisture content is less than or equal to 20 ppm.

9. The method for manufacturing a semiconductor device according to claim 6 , wherein a hydrogen concentration of the island-shaped oxide semiconductor film is less than or equal to 5×10 19 /cm 3 .

10. The method for manufacturing a semiconductor device according to claim 6 , wherein the step of adding oxygen is performed by generating plasma, mass-separating ion species included in the plasma, and accelerating the ion species having predetermined mass.

11. A method for manufacturing a semiconductor device, comprising the steps of:
forming an oxide semiconductor film over a gate electrode with a gate insulating film provided therebetween;
etching the oxide semiconductor film to form an island-shaped oxide semiconductor film so as to overlap the gate electrode with the gate insulating film provided therebetween;
adding oxygen into the island-shaped oxide semiconductor film;
performing a heat treatment on the island-shaped oxide semiconductor film after the step of adding oxygen in a state where an entire top surface of the oxide semiconductor film is exposed;
forming source and drain electrodes over the island-shaped oxide semiconductor film subjected to the heat treatment; and
forming an insulating film in contact with the island-shaped oxide semiconductor film after the step of adding oxygen and the step of performing the heat treatment,
wherein the step of adding oxygen is performed by an ion implantation method or an ion doping method.

12. The method for manufacturing a semiconductor device according to claim 11 , wherein the heat treatment is performed at a temperature higher than or equal to 300° C. and lower than or equal to 850° C.

13. The method for manufacturing a semiconductor device according to claim 11 , wherein the heat treatment is performed in air whose moisture content is less than or equal to 20 ppm.

14. The method for manufacturing a semiconductor device according to claim 11 , wherein a hydrogen concentration of the island-shaped oxide semiconductor film is less than or equal to 5×10 19 /cm 3 .

15. The method for manufacturing a semiconductor device according to claim 11 , wherein the step of adding oxygen is performed by generating plasma, mass-separating ion species included in the plasma, and accelerating the ion species having predetermined mass.

16. A method for manufacturing a semiconductor device, comprising the steps of:
forming an oxide semiconductor film over a gate electrode with a gate insulating film provided therebetween;
etching the oxide semiconductor film to form an island-shaped oxide semiconductor film so as to overlap the gate electrode with the gate insulating film provided therebetween;
adding oxygen into the island-shaped oxide semiconductor film;
performing a heat treatment on the island-shaped oxide semiconductor film after the step of adding oxygen in a state where an entire top surface of the oxide semiconductor film is exposed;
forming source and drain electrodes over the island-shaped oxide semiconductor film subjected to the heat treatment; and
forming an insulating film containing oxygen so as to be in contact with the island-shaped oxide semiconductor film after the step of adding oxygen and the step of performing the heat treatment,
wherein the step of adding oxygen is performed by an ion implantation method or an ion doping method.

17. The method for manufacturing a semiconductor device according to claim 16 , wherein the heat treatment is performed at a temperature higher than or equal to 300° C. and lower than or equal to 850° C.

18. The method for manufacturing a semiconductor device according to claim 16 , wherein the heat treatment is performed in air whose moisture content is less than or equal to 20 ppm.

19. The method for manufacturing a semiconductor device according to claim 16 , wherein a hydrogen concentration of the island-shaped oxide semiconductor film is less than or equal to 5×10 19 /cm 3 .

20. The method for manufacturing a semiconductor device according to claim 16 , wherein the step of adding oxygen is performed by generating plasma, mass-separating ion species included in the plasma, and accelerating the ion species having predetermined mass.

Assignees

• Yamazaki Shunpei
• Sakata Junichiro
• Ohara Hiroki
• Semiconductor Energy Lab

Inventors

• Yamazaki Shunpei
• Sakata Junichiro
• Ohara Hiroki

Classifications

• H10P95/90 Primary

  Thermal treatments, e.g. annealing or sintering · CPC title

• H10D64/01338

  with a treatment, e.g. annealing, after the formation of the conductor · CPC title

• H10D30/6755

  Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate · CPC title

• H10D30/031

  of thin-film transistors [TFT] · CPC title

• H10D99/00

  Subject matter not provided for in other groups of this subclass · CPC title