Method for the reduction of artifacts in image data sets and computing facility

US9224201B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9224201-B2
Application numberUS-201314010928-A
CountryUS
Kind codeB2
Filing dateAug 27, 2013
Priority dateJul 26, 2013
Publication dateDec 29, 2015
Grant dateDec 29, 2015

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Abstract

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A method for the reduction of artifacts based on an unequal representation of the same material classes in various locations, in particular of cupping artifacts, in a three-dimensional image data set, reconstructed from two-dimensional x-ray projection images is provided. An image datum, describing an attenuation value, is allocated respectively to a voxel, wherein at least two material class regions are located in a post-processing step, which receive, in particular, image data, which is homogeneously distributed and lies in an expected material class interval of the attenuation values, and, considering at least one characteristic of the material class regions, calculates a smooth homogenization function, which is to be applied to the image data of the entire image data set and is applied to the image data of the image data set.

First claim

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We claim: 1. A method for the reduction of artifacts based on an unequal representation of the same material classes in various locations in a three-dimensional image data set, reconstructed from two-dimensional x-ray projection images in which an image datum describing an attenuation value is allocated respectively to a voxel, the method performed by a computer processor and comprising: locating at least two material class regions in a post-processing step, which receive image da…

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What does patent US9224201B2 cover?
A method for the reduction of artifacts based on an unequal representation of the same material classes in various locations, in particular of cupping artifacts, in a three-dimensional image data set, reconstructed from two-dimensional x-ray projection images is provided. An image datum, describing an attenuation value, is allocated respectively to a voxel, wherein at least two material class r…
Who is the assignee on this patent?
Köhler Christoph, Schreiber Bernd, Siemens Ag
What technology area does this patent fall under?
Primary CPC classification G06T7/0012. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 29 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).