Laminar flow plating rack

US9222191B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9222191-B2
Application numberUS-201113278068-A
CountryUS
Kind codeB2
Filing dateOct 20, 2011
Priority dateOct 20, 2010
Publication dateDec 29, 2015
Grant dateDec 29, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A plating apparatus includes a vessel and a rack operable to be positioned inside the vessel. The rack includes a number of mandrels including a number of substrate mounting surfaces. The number of mandrels is non-revolving with respect to the rack. The rack further includes a number of gears coupled with the number of mandrels. A partition separates the number of gears from the number of mandrels. A diffuser is positioned below the rack. The diffuser is operable to produce a substantially uniform laminar flow of a fluid from a bottom to a top of the vessel. Thus, the laminar flow may reduce dead zones in the bath and remove defect-causing particles and gases away from the substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus comprising: a plurality of gears; a plurality of mandrels coupled with said plurality of gears, wherein each mandrel of said plurality of mandrels is coupled to a corresponding gear of said plurality of gears; a plurality of workpiece mounting indentations on said plurality of mandrels; a wall substantially isolating said plurality of gears from said plurality of workpiece mounting indentations, wherein said plurality of mandrels is substantially fixed in position with respect to said plurality of gears by said wall; and a diffuser positioned below said plurality of mandrels configured to direct plating fluid flow in parallel layers. 2. The apparatus of claim 1 , wherein each mandrel of said plurality of mandrels is operable to be rotated by said plurality of gears. 3. The apparatus of claim 1 , further comprising a plurality of retaining bars operable to maintain a plurality of workpieces within said plurality of workpiece mounting indentations and substantially free of contact with said plurality of workpieces while said plurality of workpieces are within said plurality of workpiece mounting indentations. 4. The apparatus of claim 1 , wherein said plurality of mandrels are positioned in multiple layers of horizontal rows. 5. The apparatus of claim 1 , wherein said diffuser is operable to substantially hinder the formation of dead zones within a fluid. 6. The apparatus of claim 1 , further comprising a diffuser positioned below said plurality of mandrels, wherein said diffuser is operable to produce a substantially uniform laminar flow of a fluid across said plurality of gears and said plurality of mandrels, wherein said substantially uniform laminar flow is operable to isolate particles and gas bubbles from said plurality of gears and said plurality of mandrels. 7. The apparatus of claim 1 , wherein a height of said plurality of mandrels is operable to be adjusted. 8. An apparatus comprising: a plurality of gears; a lower mandrel configured to mount a first plurality of workpieces in a lower row; an upper mandrel configured to mount a second plurality of workpieces in an upper row with respect to the lower row, wherein said upper mandrel is further configured to rotate said second plurality of workpieces at a non-revolving and fixed position within said upper row; a plurality of mandrels coupled with said plurality of gears, wherein each mandrel of said plurality of mandrels is coupled to a corresponding gear of said plurality of gears, and wherein said plurality of mandrels includes said lower mandrel and said upper mandrel; a plurality of workpiece mounting indentations on said plurality of mandrels; a wall substantially isolating said plurality of gears from said plurality of workpiece mounting indentations, wherein said plurality of mandrels is substantially fixed in position with respect to said plurality of gears; a diffuser positioned between a sparger and said plurality of mandrels configured to direct plating fluid flow in parallel layers. 9. The apparatus of claim 8 , wherein each mandrel of said plurality of mandrels-is operable to be rotated by said plurality of gears. 10. The apparatus of claim 8 , further comprising a plurality of retaining bars operable to maintain a plurality of workpieces within said plurality of workpiece mounting indentations and substantially free of contact with said plurality of workpieces while said plurality of workpieces are within said plurality of workpiece mounting indentations. 11. The apparatus of claim 8 , wherein said plurality of mandrels are positioned in multiple layers of horizontal rows. 12. The apparatus of claim 8 , further comprising a diffuser positioned below said plurality of mandrels, wherein said diffuser is operable to produce a substantially uniform laminar flow of a fluid across said plurality of gears and said plurality of mandrels, wherein said substantially uniform laminar flow is operable to isolate particles and gas bubbles from said plurality of gears and said plurality of mandrels. 13. The apparatus of claim 8 , wherein a height of said plurality of mandrels is operable to be adjusted. 14. An apparatus comprising: a plurality of mandrels coupled with a plurality of gears, wherein each mandrel of said plurality of mandrels is coupled to a corresponding gear of said plurality of gears; a plurality of workpiece mounting indentations on said plurality of mandrels configured to mount a plurality of workpieces at inner edges of the plurality of workpieces while leaving outer edges of said plurality of workpieces free of contact; a wall substantially isolating said plurality of gears from said plurality of workpiece mounting indentations, wherein said plurality of mandrels is substantially fixed in position with respect to said plurality of gears; and a diffuser positioned between a sparger and said plurality of mandrels configured to direct plating fluid flow in parallel layers. 15. The apparatus of claim 14 , wherein said plurality of mandrels is operable to be rotated by said plurality of gears. 16. The apparatus of claim 14 , further comprising a plurality of retaining bars operable to maintain a plurality of workpieces within said plurality of workpiece mounting indentations and substantially free of contact with said plurality of workpieces while said plurality of workpieces are within said plurality of workpiece mounting indentations. 17. The apparatus of claim 14 , wherein said plurality of mandrels are positioned in multiple layers of horizontal rows. 18. The apparatus of claim 14 , further comprising a diffuser positioned below said plurality of mandrels, wherein said diffuser is operable to substantially hinder the formation of dead zones within a fluid. 19. The apparatus of claim 14 , further comprising a diffuser positioned below said plurality of mandrels, wherein said diffuser is operable to produce a substantially uniform laminar flow of a fluid across said plurality of gears and said plurality of mandrels, wherein said substantially uniform laminar flow is operable to isolate particles and gas bubbles from said plurality of gears and said plurality of mandrels. 20. The apparatus of claim 14 , wherein a height of said plurality of mandrels is operable to be adjusted.

Assignees

Inventors

Classifications

  • Passing liquids or other fluent materials into or through chambers containing stationary articles · CPC title

  • Electroplating with moving electrolyte e.g. jet electroplating {(using locally applied jets of electrolyte C25D5/026)} · CPC title

  • Agitating of electrolytes; Moving of racks · CPC title

  • C25D17/008Primary

    Current shielding devices · CPC title

  • the articles being moved through the liquid or other fluent material (conveying articles through baths B65G, e.g. B65G49/02) · CPC title

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What does patent US9222191B2 cover?
A plating apparatus includes a vessel and a rack operable to be positioned inside the vessel. The rack includes a number of mandrels including a number of substrate mounting surfaces. The number of mandrels is non-revolving with respect to the rack. The rack further includes a number of gears coupled with the number of mandrels. A partition separates the number of gears from the number of mandr…
Who is the assignee on this patent?
Wong Samuel Kah Hean, Seagate Technology Llc
What technology area does this patent fall under?
Primary CPC classification C25D17/008. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 29 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).