Method of forming nanocrystals and method of manufacturing an organic light-emitting display apparatus including a thin film having nanocrystals

US9219254B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9219254-B2
Application numberUS-201313975259-A
CountryUS
Kind codeB2
Filing dateAug 23, 2013
Priority dateApr 26, 2013
Publication dateDec 22, 2015
Grant dateDec 22, 2015

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A method of forming nanocrystals includes loading a substrate into a chamber, applying a first voltage to a first target to form a thin film including a first metal compound on the substrate by sputtering, and applying a second voltage to a second target and forming nanocrystals in the thin film by sputtering.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of forming nanocrystals, the method comprising: loading a substrate into a chamber; applying a first voltage to a first target to form a thin film comprising a first metal compound on the substrate by sputtering; after forming the thin film, applying a second voltage to a second target and forming nanocrystals in the thin film by sputtering; and wherein the second voltage is higher than the first voltage. 2. The method of claim 1 , wherein the first target and the second target comprise different metals. 3. The method of claim 1 , wherein the first metal compound is a metal oxide or a metal nitride. 4. The method of claim 1 , wherein a diameter of the nanocrystals is determined by a value of the voltage applied to the second target. 5. The method of claim 1 , wherein the forming of the nanocrystals comprises doping the thin film with a second metal compound from the second target. 6. The method of claim 5 , wherein a density of the nanocrystals is determined by a doping amount of the second metal compound. 7. The method of claim 1 , wherein the first metal compound is amorphous. 8. The method of claim 1 , wherein a thickness of the thin film is about 100 nm or less. 9. The method of claim 1 , wherein a process temperature in the chamber is about 100° C. or less. 10. The method of claim 1 , wherein a density of the thin film is increased by the formation of the nanocrystals. 11. The method of claim 1 , wherein optical bandgap energy of the thin film is increased by the formation of the nanocrystals. 12. The method of claim 1 , wherein the nanocrystals are formed by crystallization of at least one metal of the first metal compound and a second metal compound from the second target. 13. The method of claim 1 , wherein the first metal compound comprises at least one of SnO x , ZnO, TiO x , indium tin oxide (ITO), and WO x . 14. A thin film having nanocrystals formed by the method of forming nanocrystals of claim 1 . 15. A method of manufacturing an organic light-emitting display apparatus, the method comprising: loading a substrate comprising at least some components of the organic light-emitting display apparatus into a chamber; applying a first voltage to a first target to form a thin film comprising a first metal compound on the substrate by sputtering; after forming the thin film, applying a second voltage to a second target and forming nanocrystals in the thin film by sputtering; and wherein the second voltage is higher than the first voltage. 16. The method of claim 15 , wherein the organic light-emitting display apparatus comprises: a first electrode; an intermediate layer comprising an organic light-emitting layer; a second electrode; and an encapsulation layer; the electrodes and layers being on the substrate and the thin film having the nanocrystals formed therein is included in the encapsulation layer. 17. The method of claim 16 , wherein the encapsulation layer comprises an organic layer and an inorganic layer. 18. The method of claim 17 , wherein the inorganic layer comprises the thin film comprising the nanocrystals. 19. The method of claim 15 , wherein the thin film is amorphous.

Assignees

Inventors

Classifications

  • using more than one target (C23C14/56 takes precedence) · CPC title

  • Oxides (C23C14/10 takes precedence) · CPC title

  • using more than one target (C23C14/56 takes precedence) · CPC title

  • Encapsulations · CPC title

  • H10K71/00Primary

    Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

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What does patent US9219254B2 cover?
A method of forming nanocrystals includes loading a substrate into a chamber, applying a first voltage to a first target to form a thin film including a first metal compound on the substrate by sputtering, and applying a second voltage to a second target and forming nanocrystals in the thin film by sputtering.
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10K71/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 22 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).