Nonvolatile flash memory structures including fullerene molecules and methods for manufacturing the same

US9219166B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9219166-B2
Application numberUS-201314138294-A
CountryUS
Kind codeB2
Filing dateDec 23, 2013
Priority dateMar 27, 2009
Publication dateDec 22, 2015
Grant dateDec 22, 2015

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Abstract

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Embodiments of tunneling barriers and methods for same can embed molecules exhibiting a monodispersion characteristic into a dielectric layer (e.g., between first and second layers forming a dielectric layer). In one embodiment, by embedding C 60 molecules inbetween first and second insulating layers forming a dielectric layer, a field sensitive tunneling barrier can be implemented. In one embodiment, the tunneling barrier can be between a floating gate and a channel in a semiconductor structure. In one embodiment, a tunneling film can be used in nonvolatile memory applications where C 60 provides accessible energy levels to prompt resonant tunneling through the dielectric layer upon voltage application. Embodiments also contemplate engineered fullerene molecules incorporated within the context of at least one of a tunneling dielectric and a floating gate within a nonvolatile flash memory structure.

First claim

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What is claimed is: 1. A nonvolatile flash memory card, comprising: a random access memory array; an input/output unit to operatively connect the random access memory to receive or transmit data; and a microcontroller to control data storage or data retrieval between the input/output unit and the random access memory array, wherein at least one cell of the random access memory array comprises, a semiconductor region having a source region, a drain region, and a channel region…

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What does patent US9219166B2 cover?
Embodiments of tunneling barriers and methods for same can embed molecules exhibiting a monodispersion characteristic into a dielectric layer (e.g., between first and second layers forming a dielectric layer). In one embodiment, by embedding C 60 molecules inbetween first and second insulating layers forming a dielectric layer, a field sensitive tunneling barrier can be implemented. In one emb…
Who is the assignee on this patent?
Univ Cornell, Nano C Inc
What technology area does this patent fall under?
Primary CPC classification H10D30/683. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 22 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).