Three dimensional nand device with channel contacting conductive source line and method of making thereof
US-2015380418-A1 · Dec 31, 2015 · US
US9219166B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9219166-B2 |
| Application number | US-201314138294-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 23, 2013 |
| Priority date | Mar 27, 2009 |
| Publication date | Dec 22, 2015 |
| Grant date | Dec 22, 2015 |
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Embodiments of tunneling barriers and methods for same can embed molecules exhibiting a monodispersion characteristic into a dielectric layer (e.g., between first and second layers forming a dielectric layer). In one embodiment, by embedding C 60 molecules inbetween first and second insulating layers forming a dielectric layer, a field sensitive tunneling barrier can be implemented. In one embodiment, the tunneling barrier can be between a floating gate and a channel in a semiconductor structure. In one embodiment, a tunneling film can be used in nonvolatile memory applications where C 60 provides accessible energy levels to prompt resonant tunneling through the dielectric layer upon voltage application. Embodiments also contemplate engineered fullerene molecules incorporated within the context of at least one of a tunneling dielectric and a floating gate within a nonvolatile flash memory structure.
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What is claimed is: 1. A nonvolatile flash memory card, comprising: a random access memory array; an input/output unit to operatively connect the random access memory to receive or transmit data; and a microcontroller to control data storage or data retrieval between the input/output unit and the random access memory array, wherein at least one cell of the random access memory array comprises, a semiconductor region having a source region, a drain region, and a channel region…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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