Group III-V Device with a Selectively Modified Impurity Concentration
US-2015380497-A1 · Dec 31, 2015 · US
US9214596B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9214596-B2 |
| Application number | US-201113880708-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 26, 2011 |
| Priority date | Oct 26, 2010 |
| Publication date | Dec 15, 2015 |
| Grant date | Dec 15, 2015 |
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According to the present invention, a method for manufacturing a compound semiconductor comprises: forming a graphene-derived material layer on either a first selected substrate or a first selected compound semiconductor layer; forming a second compound semiconductor layer of at least one layer on at least said graphene-derived material layer, and changing the graphene-derived material layer so as to separate said second compound semiconductor layer of at least one layer.
Opening claim text (preview).
What is claimed is: 1. A method for manufacturing a compound semiconductor, the method comprising: forming a graphene-derived material layer on one of a first substrate and a first compound semiconductor layer; forming at least one layer of second compound semiconductor layers on the graphene-derived material layer; and transforming the graphene-derived material layer into a graphene oxide layer to separate at least one layer of the second compound semiconductor layers from th…
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