Cleaning solution and cleaning method for a semiconductor substrate or device
US-2019048293-A1 · Feb 14, 2019 · US
US9212340B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9212340-B2 |
| Application number | US-201113877548-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 4, 2011 |
| Priority date | Oct 5, 2010 |
| Publication date | Dec 15, 2015 |
| Grant date | Dec 15, 2015 |
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The present disclosure relates to a dimethyl sulfoxide composition suitable for cleaning polymer residue found on the devices used for processing plastic materials, in particular polyurethane.
Opening claim text (preview).
The invention claimed is: 1. A composition consisting of: from 40% to 95% of dimethyl sulfoxide (DMSO); from 1% to 30% of at least one amine, wherein the at least one amine is selected from primary, secondary, or tertiary amines; from 5% by weight to 30% of water; and from 0% by weight to 10% of at least one additive, wherein the additive is selected from the group consisting of corrosion inhibitors, antioxidants, dyes, and aromas. 2. The composition a…
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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