Method and apparatus for generating plasma pulses

US9210792B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9210792-B2
Application numberUS-201313746784-A
CountryUS
Kind codeB2
Filing dateJan 22, 2013
Priority dateJan 23, 2012
Publication dateDec 8, 2015
Grant dateDec 8, 2015

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  1. Title

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  2. Abstract

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

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A method and apparatus generates pulses that can be used for high-precision three-dimensional plasma treatment. At least two sources are furnished with at least one time function, wherein each of the at least two sources radiates an electromagnetic field generated by one of the time functions, and the at least one time function. In a method, the at least two sources cooperate in such a manner that at least one predetermined field strength is realized sequentially in a temporal succession in at least two predetermined space-time points. An alternative method uses at least one source and at least one reflection element. An apparatus with at least two sources and at least one data processing device or at least one source, at least one reflection element and at least one data processing device is configured such that one of the methods can be executed.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for generating plasma pulses, wherein at least two sources of which each is furnished with at least one corresponding time function, wherein each of the at least two sources radiates an electromagnetic field generated by the at least one corresponding time function, and the at least one corresponding time functions and the at least two sources cooperate in such a manner that a constructive temporal and spatial superposition of the radiated electromagnetic fields of at least one predetermined field strength is realized sequentially in a temporal succession in at least two predetermined space-time points, wherein the at least two predetermined space-time points correspond to different locations in three dimensional space. 2. The method according to claim 1 , wherein the at least one predetermined space-time point is reached by at least one of the time functions on at least two different propagation paths. 3. The method according to claim 1 , wherein the predetermined space-time points form a one-, two- or three-dimensional structure. 4. The method according to claim 1 , wherein at least one time function is determined by outputting a predetermined pulse in a space point and recording said pulse as a pulse response in the places of the at least two sources. 5. The method according to claim 1 , wherein at least one source is furnished with the time-inverted pulse response. 6. A method for generating plasma pulses, wherein at least one source is furnished with a time function, wherein the at least one source radiates an electromagnetic field generated by the time function and the time function, the at least one source and at least one reflection element cooperate in such a manner that, by constructive temporal and spatial superposition of reflected parts of the radiated electromagnetic field upon the electromagnetic field, at least one predetermined field strength is realized sequentially in a temporal succession in at least two predetermined space-time points, wherein the at least two predetermined space-time points correspond to different locations in three dimensional space. 7. The method according to claim 6 , wherein the predetermined space-time points form a one-, two- or three-dimensional structure. 8. The method according to claim 6 , wherein at least one time function is determined by outputting a predetermined pulse in a space point and recording said pulse as a pulse response in the places of the at least two sources. 9. The method according to claim 6 , wherein at least one source is furnished with the time-inverted pulse response.

Assignees

Inventors

Classifications

  • using an arc (H05H1/26 takes precedence) · CPC title

  • H05H1/46Primary

    using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title

  • Antennas · CPC title

  • using particular waveforms, e.g. polarised waves · CPC title

  • Arrangements for generating the plasma · CPC title

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What does patent US9210792B2 cover?
A method and apparatus generates pulses that can be used for high-precision three-dimensional plasma treatment. At least two sources are furnished with at least one time function, wherein each of the at least two sources radiates an electromagnetic field generated by one of the time functions, and the at least one time function. In a method, the at least two sources cooperate in such a manner t…
Who is the assignee on this patent?
Forschungsverbund Berlin Ev
What technology area does this patent fall under?
Primary CPC classification H05H1/46. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 08 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).