Method for manufacturing a magnetic sensor

US9207293B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9207293-B2
Application numberUS-201213466887-A
CountryUS
Kind codeB2
Filing dateMay 8, 2012
Priority dateMar 12, 2010
Publication dateDec 8, 2015
Grant dateDec 8, 2015

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Abstract

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A magnetic sensor having no sensitivity differences between sensitivity axes, and an easy manufacturing method therefor are provided. The method includes a process of forming first stacked films for a magnetoresistive element on a substrate. This element has a sensitivity axis in a certain direction and includes a self-pinned ferromagnetic pinned layer in which first and second ferromagnetic films are antiferromagnetically coupled through an antiparallel coupling layer, a nonmagnetic intermediate layer, and a soft magnetic free layer. The method further includes a process of removing a region of the first stacked films from the substrate. The remaining region of the films includes at least a region to be left to form the element. The method furthermore includes a process of forming second stacked films for a magnetoresistive element, which has a sensitivity axis in a direction different from the certain direction and has the same structure, on the exposed substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for manufacturing a magnetic sensor, the method comprising: forming a first stack of films on a substrate for a first magnetoresistive element having a sensitivity axis in a first direction, the first stack of films including: a self-pinned ferromagnetic pinned layer formed of a first ferromagnetic film, a second ferromagnetic film, and an antiparallel coupling layer interposed therebetween, the first and second ferromagnetic films being antiferrom…

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What does patent US9207293B2 cover?
A magnetic sensor having no sensitivity differences between sensitivity axes, and an easy manufacturing method therefor are provided. The method includes a process of forming first stacked films for a magnetoresistive element on a substrate. This element has a sensitivity axis in a certain direction and includes a self-pinned ferromagnetic pinned layer in which first and second ferromagnetic fi…
Who is the assignee on this patent?
Ando Hideto, Sugihara Shinji, Koike Fumihito, and 2 more
What technology area does this patent fall under?
Primary CPC classification G01R33/093. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 08 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).