Particle capture devices and methods of use thereof

Patent metadata

Field	Value
Publication number	US-9201060-B2
Application number	US-86703109-A
Country	US
Kind code	B2
Filing date	Feb 11, 2009
Priority date	Feb 11, 2008
Publication date	Dec 1, 2015
Grant date	Dec 1, 2015

Abstract

The present invention provides a device and methods of use thereof in microscale particle capturing and particle pairing. This invention provides particle patterning device, which mechanically traps individual particles within first chambers of capture units, transfer the particles to second chambers of opposing capture units, and traps a second type of particle in the same second chamber. The device and methods allow for high yield assaying of trapped cells, high yield fusion of trapped, paired cells, for controlled binding of particles to cells and for specific chemical reactions between particle interfaces and particle contents. The device and method provide means of identification of the particle population and a facile route to particle collection.

First claim

What is claimed is:

1. A particle patterning device comprising:
a first substrate;
at least one capture unit positioned such that the top of said capture unit is adhered to or contiguous with said first substrate, said capture unit comprising:
a first chamber comprising at least one opening, sized to trap and accommodate a single particle; and
a second chamber comprising at least one opening, sized to trap and accommodate a single or more than a single particle;

wherein an opening of said first chamber faces a direction opposite to that of an opening of said second chamber, and said opening of said first chamber is contiguous with a side of said capture unit, said opening of said second chamber is contiguous with an opposite side of said capture unit;
a second substrate positioned proximally to or adhered to a bottom of said capture unit or a portion thereof;
a first conduit through which a first flow is induced in said device, such that said first flow is accommodated at least between said capture unit and said second substrate and particles positioned within said first or second chamber are subject to said first flow, wherein said first conduit, said capture unit, and said second substrate are configured to accommodate said first flow in a direction towards the opening of the first chamber; and
a second conduit through which a second flow is induced in a direction opposite to that of said first flow and towards the opening of the second chamber, such that said second flow is accommodated at least between said capture unit and said second substrate and particles positioned within the first or second chamber are subject to said second flow.

2. The particle patterning device of claim 1 , further comprising at least one supporting structure positioned between said first and said second substrate, which aids in suspending said capture unit over said second substrate, at a height sufficient to accommodate fluid flow between said second substrate and said capture unit.

3. The particle patterning device of claim 2 , wherein said at least one supporting structure is proximal to or contiguous with at least a portion of said capture unit.

4. The particle patterning device of claim 1 , wherein said first chamber, said second chamber, or a combination thereof comprise at least one additional opening, which is sized such that said opening cannot trap or accommodate one or more particles.

5. The particle patterning device of claim 4 , wherein said additional opening is positioned between said first and second chamber such that said opening facilitates fluid communication between said first and said second chamber.

6. The particle patterning device of claim 1 , further comprising controllers to maintain desirable environmental conditions.

7. The particle patterning device of claim 6 , wherein said controllers maintain a desired temperature, pH, CO 2 or Oxygen conditions, or a combination thereof.

8. The particle patterning device of claim 1 , wherein said device is comprised of a transparent material.

9. The particle patterning device of claim 8 , wherein said transparent material is pyrex, quartz, Polydimethylsiloxane (PDMS) or SU-8.

10. The particle patterning device of claim 1 , further comprising electric connections between said first capture unit, said second capture unit or a combination thereof and a power supply.

11. The particle patterning device of claim 1 , wherein said device is a microfluidic device.

12. The particle patterning device of claim 1 , wherein said first chamber has a width ranging from between 5-500 μm and a depth ranging from between 5-500 μm.

13. The particle patterning device of claim 12 , wherein said first chamber has a width of about 10 μm and a depth of about 5 μm.

14. The particle patterning device of claim 1 , wherein said second chamber has a width ranging from between 5-500 μm and a depth ranging from between 5-500 μm.

15. The particle patterning device of claim 14 , wherein said second chamber has a width of about 10 μm to about 35 μm and a depth of about 5.5 μm to about 50 μm.

16. The particle patterning device of claim 1 , comprising an array of capture units.

17. The particle patterning device of claim 16 , wherein said array is arranged in a row or column scheme or a combination thereof.

18. The particle patterning device of claim 17 , wherein said scheme comprises a spacing between said row or column or combination thereof, said spacing approximate in width to a diameter of a particle being applied to said device.

19. The particle patterning device of claim 17 , wherein said scheme comprises asymmetrically positioning a capture unit in a first row off-set from that of a capture unit in a preceding or subsequent row.

20. The particle patterning device of claim 19 , wherein said off-set is half the center-to-center distance between two capture units.

21. An apparatus comprising the particle patterning device of claim 1 .

22. The apparatus of claim 21 , wherein an illumination source is coupled to said device.

23. The apparatus of claim 22 , wherein the illumination source is a laser.

24. The apparatus of claim 22 , wherein a beam splitter is employed with the use of said illumination source.

25. The apparatus of claim 21 , further comprising a detector, which detects a change in a parameter in said device.

26. The apparatus of claim 25 , wherein said detector comprises a camera, a computer, a luminometer, a spectrophotometer, or a combination thereof.

27. A method for patterning individual particles, said method comprising:
(i) applying a first liquid comprising a series of first particles to a particle patterning device under flow in a first direction, whereby an individual particle is accommodated within a first capture unit of said particle patterning device, said device comprising:
a first substrate;
at least one capture unit positioned such that the top of said capture unit is adhered to or contiguous with said first substrate, said capture unit comprising:
a first chamber comprising at least one opening, sized to trap and accommodate a single particle; and
a second chamber comprising at least one opening, sized to trap and accommodate a single or more than a single particle;

wherein an opening of said first chamber faces a direction opposite to that of an opening of said second chamber, and said opening of said first chamber is contiguous with a side of said capture unit, said opening of said second chamber is contiguous with an opposite side of said capture unit;
a second substrate positioned proximally to or adhered to a bottom of said capture unit or a portion thereof;
a first conduit through which a first flow is induced in said device, such that said first flow is accommodated at least between said capture unit and said second substrate and particles positioned within said first or second chamber are subject to said first flow, wherein said first conduit, said capture unit, and said second substrate are configured to accommodate said first flow in a direction towards the opening of the first chamber; and
a second conduit through which a second flow is induced in a direction opposite to that of said first flow and towards the opening of the second chamber, such that said second flow is accommodated at least between said capture unit and said second substrate and particles positioned within the first or second chamber a

Assignees

• Voldman Joel
• Skelley Alison M
• Kirak Oktay
• Jaenisch Rudolf
• Massachusetts Inst Technology

Inventors

• Voldman Joel
• Skelley Alison M
• Kirak Oktay
• Jaenisch Rudolf

Classifications

• B01L2400/0421

  electrophoretic flow · CPC title

• B01L2200/0668

  Trapping microscopic beads · CPC title

• B01L2200/12

  Specific details about manufacturing devices · CPC title

• B01L2200/10

  Integrating sample preparation and analysis in single entity, e.g. lab-on-a-chip concept · CPC title

• B01L2400/0424

  Dielectrophoretic forces · CPC title