Method and apparatus for gas delivery

US9200367B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9200367-B2
Application numberUS-201113191008-A
CountryUS
Kind codeB2
Filing dateJul 26, 2011
Priority dateApr 29, 2011
Publication dateDec 1, 2015
Grant dateDec 1, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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Methods and apparatus for gas delivery are disclosed herein. In some embodiments, a gas delivery system includes an ampoule for storing a precursor in solid or liquid form, a first conduit coupled to the ampoule and having a first end coupled to a first gas source to draw a vapor of the precursor from the ampoule into the first conduit, a second conduit coupled to the first conduit at a first junction located downstream of the ampoule and having a first end coupled to a second gas source and a second end coupled to a process chamber, and a heat source configured to heat the ampoule and at least a first portion of the first conduit from the ampoule to the second conduit and to heat only a second portion of the second conduit, wherein the second portion of the second conduit includes the first junction.

First claim

Opening claim text (preview).

The invention claimed is: 1. A gas delivery system, comprising: an ampoule for storing a precursor in solid or liquid form; a first conduit coupled to the ampoule and having a first end coupled to a first gas source to draw a vapor of the precursor from the ampoule into the first conduit; a second conduit coupled to the first conduit at a first junction located downstream of the ampoule and having a first end coupled to a second gas source and a second end coupled to a proces…

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What does patent US9200367B2 cover?
Methods and apparatus for gas delivery are disclosed herein. In some embodiments, a gas delivery system includes an ampoule for storing a precursor in solid or liquid form, a first conduit coupled to the ampoule and having a first end coupled to a first gas source to draw a vapor of the precursor from the ampoule into the first conduit, a second conduit coupled to the first conduit at a first j…
Who is the assignee on this patent?
Ye Zhiyuan, Kim Yihwan, Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification C23C16/4481. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 01 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).