Method for producing glass substrate and glass substrate

US9199869B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9199869-B2
Application numberUS-201113636474-A
CountryUS
Kind codeB2
Filing dateMar 22, 2011
Priority dateMar 23, 2010
Publication dateDec 1, 2015
Grant dateDec 1, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention is aimed to provide a method for producing a glass substrate with a thickness of not more than 200 μm, which is satisfied with the quality required for a substrate on which a thin-film electric circuit is formed, and a sheet glass substrate obtained according to this method. The present invention is concerned with a method for producing a glass substrate having a sheet thickness of from 10 to 200 μm, including a forming step of forming a molten glass into a ribbon shape in accordance with a down draw method, an annealing step of annealing the glass ribbon, and a cutting step of cutting the glass ribbon to give a glass substrate, wherein an average cooling rate in a temperature range of from the (annealing point+200° C.) to the (annealing point+50° C.) is controlled to the range of from 300 to 2,500° C./min.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing a glass substrate having a sheet thickness of from 10 to 200 μm, which comprises; a forming step of forming a molten glass into a ribbon shape in accordance with a down draw method; an annealing step of annealing the glass ribbon; and a cutting step of cutting the glass ribbon to obtain a glass substrate, wherein in the annealing step, an average cooling rate in a temperature range of a first annealing temperature region d…

Assignees

Inventors

Classifications

  • Cross-Sectional Technologies · mapped topic

  • C03C3/091Primary

    Chemistry & Metallurgy · mapped topic

  • C03B17/067Primary

    Chemistry & Metallurgy · mapped topic

  • Cross-Sectional Technologies · mapped topic

  • Chemistry & Metallurgy · mapped topic

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What does patent US9199869B2 cover?
The present invention is aimed to provide a method for producing a glass substrate with a thickness of not more than 200 μm, which is satisfied with the quality required for a substrate on which a thin-film electric circuit is formed, and a sheet glass substrate obtained according to this method. The present invention is concerned with a method for producing a glass substrate having a sheet thi…
Who is the assignee on this patent?
Kawaguchi Takahiro, Fujiwara Katsutoshi, Kato Yoshinari, and 2 more
What technology area does this patent fall under?
Primary CPC classification C03C3/091. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 01 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).