Avalanche photodiode
US-2024204127-A1 · Jun 20, 2024 · US
US9196780B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9196780-B2 |
| Application number | US-201414582505-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 24, 2014 |
| Priority date | Jun 29, 2012 |
| Publication date | Nov 24, 2015 |
| Grant date | Nov 24, 2015 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Disclosed is a solar cell that comprises a substrate made of a semiconductor material, a first amorphous semiconductor layer placed on one region of the substrate and being of one conductivity type, a second amorphous semiconductor layer placed on another region of the substrate and being of another conductivity type, a substantially intrinsic i-type amorphous semiconductor layer provided above the first amorphous semiconductor layer, a third amorphous semiconductor layer provided on the i-type amorphous semiconductor layer and being of the other conductivity type, a first crystalline semiconductor layer placed between the first amorphous semiconductor layer and the i-type amorphous semiconductor layer and being of the one conductivity type, and a second crystalline semiconductor layer placed between the first crystalline semiconductor layer and the i-type amorphous semiconductor layer and being of the other conductivity type.
Opening claim text (preview).
The invention claimed is: 1. A solar cell comprising: a substrate; a first amorphous semiconductor layer arranged at a first region of the substrate and being of a first conductivity type; a second amorphous semiconductor layer arranged at a second region of the substrate and being of a second conductivity type; a substantially intrinsic i-type amorphous semiconductor layer provided above the first amorphous semiconductor layer; a third amorphous semiconductor layer provided on the i-type amorphous semiconductor layer and being of the second conductivity type; a first crystalline semiconductor layer arranged between the first amorphous semiconductor layer and the i-type amorphous semiconductor layer and being of the first conductivity type; and a second crystalline semiconductor layer arranged between the first crystalline semiconductor layer and the i-type amorphous semiconductor layer and being of the second conductivity type. 2. The solar cell according to claim 1 , wherein the first and second crystalline semiconductor layers are made of a microcrystalline semiconductor. 3. The solar cell according to claim 1 , wherein the one conductivity type is an n-type, and the other conductivity type is a p-type. 4. The solar cell according to claim 1 , further comprising: a second substantially intrinsic i-type amorphous semiconductor layer provided between the first amorphous semiconductor layer and the substrate. 5. The solar cell according to claim 1 , wherein the first crystalline semiconductor layer has a thickness of about 1 nm to 30 nm. 6. The solar cell according to claim 1 , wherein the first crystalline semiconductor layer has a thickness of about 1 nm to 15 nm. 7. The solar cell according to claim 1 , wherein the second crystalline semiconductor layer has a thickness of about 1 nm to 30 nm. 8. The solar cell according to claim 1 , wherein the second crystalline semiconductor layer has a thickness of about 1 nm to 15 nm. 9. The solar cell according to claim 2 , wherein the microcrystalline semiconductor is made substantially of semiconductor crystal grains. 10. The solar cell according to claim 2 , wherein the second crystalline semiconductor includes a semiconductor amorphous region and a semiconductor crystal grains region.
Shapes of potential barriers · CPC title
The active layers comprising only Group IV materials · CPC title
the Group IV-IV heterojunctions being heterojunctions of crystalline and amorphous materials, e.g. silicon heterojunction [SHJ] photovoltaic cells · CPC title
Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side · CPC title
Photovoltaic cells having only PIN junction potential barriers · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.