Methods for removing particles from etching chamber
US-9355823-B2 · May 31, 2016 · US
US9196462B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9196462-B2 |
| Application number | US-201213649913-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 11, 2012 |
| Priority date | Jan 10, 2008 |
| Publication date | Nov 24, 2015 |
| Grant date | Nov 24, 2015 |
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The present invention generally comprises a showerhead insulator for electrically isolating a showerhead assembly from a processing chamber wall, a chamber liner assembly for lining a processing chamber, a lower chamber liner for lining an evacuation area of a processing chamber, and a flow equalizer for ensuring a uniform evacuation of a processing chamber. When processing a substrate within an etching chamber, the showerhead needs to be electrically isolated from ground. A showerhead insulator may insulate the showerhead from ground while also preventing plasma from entering the volume that it occupies. A chamber liner may protect the chamber walls from contamination and reduce chamber cleaning. A flow equalizer will permit processing gases to be evenly pulled into the evacuation channel rather than a disproportionate flow into the evacuation channel. A lower liner can aid in uniformly drawing the vacuum and protecting the chamber walls from contamination.
Opening claim text (preview).
The invention claimed is: 1. A chamber liner assembly, comprising: a liner body having a flange portion, a slit valve portion, and a ledge portion, wherein the slit valve portion is directly coupled to the ledge portion and the ledge portion is directly coupled to the flange portion, such that the flange portion is above the slit valve portion, wherein the ledge portion comprises: a first top surface coupled to the flange portion, a first outside surface, a first bottom surface, a…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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