Showerhead insulator and etch chamber liner

US9196462B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9196462-B2
Application numberUS-201213649913-A
CountryUS
Kind codeB2
Filing dateOct 11, 2012
Priority dateJan 10, 2008
Publication dateNov 24, 2015
Grant dateNov 24, 2015

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present invention generally comprises a showerhead insulator for electrically isolating a showerhead assembly from a processing chamber wall, a chamber liner assembly for lining a processing chamber, a lower chamber liner for lining an evacuation area of a processing chamber, and a flow equalizer for ensuring a uniform evacuation of a processing chamber. When processing a substrate within an etching chamber, the showerhead needs to be electrically isolated from ground. A showerhead insulator may insulate the showerhead from ground while also preventing plasma from entering the volume that it occupies. A chamber liner may protect the chamber walls from contamination and reduce chamber cleaning. A flow equalizer will permit processing gases to be evenly pulled into the evacuation channel rather than a disproportionate flow into the evacuation channel. A lower liner can aid in uniformly drawing the vacuum and protecting the chamber walls from contamination.

First claim

Opening claim text (preview).

The invention claimed is: 1. A chamber liner assembly, comprising: a liner body having a flange portion, a slit valve portion, and a ledge portion, wherein the slit valve portion is directly coupled to the ledge portion and the ledge portion is directly coupled to the flange portion, such that the flange portion is above the slit valve portion, wherein the ledge portion comprises: a first top surface coupled to the flange portion, a first outside surface, a first bottom surface, a…

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What does patent US9196462B2 cover?
The present invention generally comprises a showerhead insulator for electrically isolating a showerhead assembly from a processing chamber wall, a chamber liner assembly for lining a processing chamber, a lower chamber liner for lining an evacuation area of a processing chamber, and a flow equalizer for ensuring a uniform evacuation of a processing chamber. When processing a substrate within a…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H01J37/32633. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).