Photosensitive resin composition for black matrix and application thereof
US-2015370162-A1 · Dec 24, 2015 · US
Method of manufacturing black column spacer, black column spacer, and color filter
US9170486B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9170486-B2 |
| Application number | US-201414305235-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 16, 2014 |
| Priority date | Mar 27, 2014 |
| Publication date | Oct 27, 2015 |
| Grant date | Oct 27, 2015 |
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Abstract
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Disclosed are a method of manufacturing a black column spacer that includes preparing a substrate; forming a first organic layer on the substrate; forming a second organic layer on the first organic layer; performing exposure on the substrate on which the first organic layer and the second organic layer are formed using a half-tone mask; and developing the substrate and curing the resultant product, a black column spacer manufactured using the manufacturing method, and a color filter including the black column spacer.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of manufacturing a black column spacer, comprising: preparing a substrate, forming a first organic layer on the substrate, forming a second organic layer on the first organic layer, performing exposure on the substrate on which the first organic layer and the second organic layer are formed using a half-tone mask, and developing the substrate and curing the resultant product. 2. The method of claim 1 , wherein the firs…
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Physics · mapped topic
- G03F7/0007Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US9170486B2 cover?
- Disclosed are a method of manufacturing a black column spacer that includes preparing a substrate; forming a first organic layer on the substrate; forming a second organic layer on the first organic layer; performing exposure on the substrate on which the first organic layer and the second organic layer are formed using a half-tone mask; and developing the substrate and curing the resultant pro…
- Who is the assignee on this patent?
- Cheil Ind Inc
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0007. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Oct 27 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).