Manufacturing method for photomask, and photomask
US-2024427229-A1 · Dec 26, 2024 · US
US9170482B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9170482-B2 |
| Application number | US-201414231913-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 1, 2014 |
| Priority date | Jan 18, 2012 |
| Publication date | Oct 27, 2015 |
| Grant date | Oct 27, 2015 |
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Near-neighbor trimming of dummy fill shapes with built-in optical proximity corrections (OPCs) for semiconductor applications is provided. A method for the near-neighbor trimming includes adding one or more hole shapes onto a semiconductor design layout comprising a plurality of design shapes. The method further includes trimming adjacent ones of the plurality of which are covered by the one or more hole shapes.
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What is claimed: 1. A computer program product comprising a computer usable storage medium having readable program code embodied in the storage medium, the computer program product includes at least one component operable to: place at least one set of design shapes in a first region of a semiconductor design or test layout; place a plurality of sets of design shapes in a second region of the semiconductor design or test layout, the plurality of sets of design shapes being one of…
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