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Process for depositing ceramic or organoceramic material on a substrate
US9169552B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9169552-B2 |
| Application number | US-201013394013-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 19, 2010 |
| Priority date | Sep 4, 2009 |
| Publication date | Oct 27, 2015 |
| Grant date | Oct 27, 2015 |
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Abstract
Official abstract text for this publication.
A process for the application of layers composed of ceramic or organoceramic materials on surfaces of metals, semimetals or compounds thereof and also components or assemblies made of these materials by a chemical deposition process from the gas phase at atmospheric pressure or 30% below this and process temperatures during deposition below 500° C. The deposition process is carried out in one operation, wherein the reactive chemical substances and the precursors are homogeneously backmixed in the common gas space, and the average residence time as a ratio of volume of the gas space to gas throughput is matched to the rate-determining step of the catalyzed gas-phase reaction of the coating process so as to achieve a deposition rate of from 10 to 2000 nm per hour.
First claim
Opening claim text (preview).
The invention claimed is: 1. A process for forming layers containing a ceramic or organoceramic material on the surface of a metal, semimetal or compounds thereof comprising a step of forming the layers containing a ceramic or organoceramic material on the surface of the metal, semimetal or compound thereof by a chemical deposition process conducted at a temperature less than 500° C. and a pressure no greater than atmospheric, wherein reactive chemical substances used for layer fo…
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- C23C16/402Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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- What does patent US9169552B2 cover?
- A process for the application of layers composed of ceramic or organoceramic materials on surfaces of metals, semimetals or compounds thereof and also components or assemblies made of these materials by a chemical deposition process from the gas phase at atmospheric pressure or 30% below this and process temperatures during deposition below 500° C. The deposition process is carried out in one o…
- Who is the assignee on this patent?
- Merkel Till, Lehnert Christian, Wieland Werke Ag
- What technology area does this patent fall under?
- Primary CPC classification C23C16/402. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Oct 27 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).