Substrate processing apparatus and control method for a substrate processing apparatus
US-2024120204-A1 · Apr 11, 2024 · US
US9162209B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9162209-B2 |
| Application number | US-201313779056-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 27, 2013 |
| Priority date | Mar 1, 2012 |
| Publication date | Oct 20, 2015 |
| Grant date | Oct 20, 2015 |
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A substrate processing system includes one or more processing chambers defining N reaction volumes. N-1 first valves are arranged between the N reaction volumes. A controller communicates with the N-1 first valves and is configured to pressurize a first one of the N reaction volumes with precursor gas to a first target pressure, wait a first predetermined soak period, evacuate a second one of the N reaction volumes to a second target pressure that is lower than the first target pressure, and open one of the N-1 first valves between the first one of the N reaction volumes and a second one of the N reaction volumes.
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What is claimed is: 1. A substrate processing system comprising: N processing chambers defining N reaction volumes, wherein N is an integer greater than one; N-1 first valves arranged between the N reaction volumes, wherein a reaction volume refers to a volume in which a substrate is exposed to a precursor gas; a controller in communication with the N-1 first valves and configured to: pressurize a first one of the N reaction volumes with the precursor gas to a first target pr…
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