Optical scanning device and image forming apparatus including the same
US-9223131-B2 · Dec 29, 2015 · US
US9158107B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9158107-B2 |
| Application number | US-201213626600-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 25, 2012 |
| Priority date | Oct 21, 2011 |
| Publication date | Oct 13, 2015 |
| Grant date | Oct 13, 2015 |
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Provided is technique for a semiconductor device including a substrate and a tilting plate which is tiltable relatively to the substrate, the technique being capable of effectively suppressing warpage of the tilting plate. The semiconductor device of the present specification includes a substrate and a tilting plate which is tiltable relatively to the substrate. In the semiconductor device, a rib formed of wavelike portions where a plate thickness is substantially uniform is formed on the tilting plate.
Opening claim text (preview).
What is claimed is: 1. A plate-shaped member formed by using a semiconductor process and having a planar expansion, comprising: a flat area substantially coplanar with a plane of the plate-shaped member; and a rib in a different position than the flat area in a direction normal to the plane, wherein the rib is recessed on one side and equally projecting on another side of the plate-shaped member. 2. The plate-shaped member according to claim 1 , wherein the rib and the flat area are connected to each other through an inclined portion that is at an oblique angle to the plane. 3. The plate-shaped member according to claim 1 , further comprising: a conductive layer and an insulating film which covers a periphery of the conductive layer. 4. The plate-shaped member according to claim 1 , wherein shapes of the rib and flat area are determined by using a structure optimization method which minimizes an amount in deformation of the plate-shaped member with respect to internal stress. 5. A semiconductor device comprising: a substrate; and a tilting plate which is tiltable relatively to the substrate, including: a flat area substantially coplanar with a plane of the plate-shaped member; and a rib configured to relieve influence of remaining stress in a direction normal to the plane, wherein the rib is recessed on one side and equally projecting on another side of the tilting plate. 6. The semiconductor device according to claim 5 , wherein an inclined portion that is at an oblique angle to the plane is formed on a side wall of the rib. 7. The semiconductor device according to claim 5 , wherein the tilting plate includes a conductive layer and an insulating film which covers a periphery of the conductive layer. 8. The semiconductor device according to claim 5 , further comprising a mirror which is fixed to the tilting plate. 9. The semiconductor device according to claim 5 , wherein a shape of the rib of the tilting plate is determined by using a structure optimization method which minimizes an amount in deformation of the tilting plate with respect to internal stress. 10. A plate-shaped member formed by using a semiconductor process and having a planar expansion, comprising: a flat area substantially coplanar with a plane of the plate-shaped member; and a rib in a different position than the flat area in a direction normal to the plane, wherein the rib is recessed on one side and equally projecting on an other side of the plate-shaped member, and the rib and the flat area are connected to each other through an inclined portion that is at an oblique angle to the plane.
the reflecting element being moved or deformed by electrostatic means · CPC title
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