Holding device, method of determining attraction abnormality in holding device, lithography apparatus, and method of manufacturing article
US-2024393682-A1 · Nov 28, 2024 · US
US9155201B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9155201-B2 |
| Application number | US-201314094841-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 3, 2013 |
| Priority date | Dec 3, 2013 |
| Publication date | Oct 6, 2015 |
| Grant date | Oct 6, 2015 |
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Conductive articles and devices have conductive micro-wires formed by curing a photocurable layer on a transparent flexible substrate that has a distortion temperature of less than 150° C. The photocurable layer has a viscosity <5,000 Pascal-seconds at the temperature micro-channels formation and the micro-channels having an average width of less than or equal to 4 μm and an average depth to average width ratio that is greater than or equal to 1. The photocurable layer is exposed to curing ultraviolet radiation to form a pattern of photocured micro-channels and a conductive composition comprising metal nano-particles is formed in the photocured micro-channels. The conductive composition is cured in the pattern of photocured micro-channels to provide a pattern of conductive micro-wires in the pattern of photocured micro-channels on the transparent flexible substrate. Each of at least 50% of the conductive micro-wires has a sheet resistance of less than 0.025 ohms/sq.
Opening claim text (preview).
The invention claimed is: 1. A method for making a micro-wire pattern in an article, the method comprising: providing a photocurable layer on a transparent flexible substrate that has a distortion temperature of less than 150° C., forming a pattern of micro-channels within the photocurable layer that has a viscosity of less than 5,000 Pascal-seconds at the temperature at which the micro-channels are formed, the micro-channels having an average width of less than or equal to 4 μm…
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