Tuning a parameter associated with plasma impedance

Patent metadata

Field	Value
Publication number	US-9155182-B2
Application number	US-201313740047-A
Country	US
Kind code	B2
Filing date	Jan 11, 2013
Priority date	Jan 11, 2013
Publication date	Oct 6, 2015
Grant date	Oct 6, 2015

Abstract

Systems and methods for tuning a parameter associated with plasma impedance are described. One of the methods includes receiving information to determine a variable. The information is measured at a transmission line and is measured when the parameter has a first value. The transmission line is used to provide power to a plasma chamber. The method further includes determining whether the variable is at a local minima and providing the first value to tune the impedance matching circuit upon determining that the variable is at the local minima. The method includes changing the first value to a second value of the parameter upon determining that the variable is not at the local minima and determining whether the variable is at a local minima when the parameter has the second value.

First claim

The invention claimed is:

1. A method for tuning a parameter associated with plasma impedance, comprising:
receiving information to determine a variable, the information measured at a transmission line, the information measured when the parameter has a first value, the transmission line used to provide power to a plasma chamber via an impedance matching circuit;
determining whether the variable is at a local minima;
providing the first value to tune the impedance matching circ…

Assignees

• Valcore Jr John C
• Lyndaker Bradford J
• Lam Res Corp

Inventors

• Valcore Jr John C
• Lyndaker Bradford J

Classifications

• H05H2242/26

  Electricity · mapped topic

• H01J37/321 Primary

  Electricity · mapped topic

• H01J37/32183

  Electricity · mapped topic

• H05H1/46 Primary

  Electricity · mapped topic

• H01J37/32935

  Electricity · mapped topic