Distributed multi-zone plasma source systems, methods and apparatus

US9155181B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9155181-B2
Application numberUS-85235210-A
CountryUS
Kind codeB2
Filing dateAug 6, 2010
Priority dateAug 6, 2010
Publication dateOct 6, 2015
Grant dateOct 6, 2015

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  2. Abstract

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  5. First independent claim

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Abstract

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A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.

First claim

Opening claim text (preview).

The invention claimed is: 1. A plasma source comprising: a ring plasma chamber disposed in a processing chamber, top the ring plasma chamber having a ring shape which is oriented parallel to the processing chamber top such that the ring plasma chamber does not pass through the processing chamber top and into a corresponding processing chamber; a primary winding around an exterior circumference of the ring plasma chamber; a plurality of ferrites, wherein the ring plasma chambe…

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What does patent US9155181B2 cover?
A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.
Who is the assignee on this patent?
Shajii Ali, Gottscho Richard, Benzerrouk Souheil, and 4 more
What technology area does this patent fall under?
Primary CPC classification H05H1/46. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 06 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).