Coil structure for generating plasma and semiconductor equipment
US-2024339296-A1 · Oct 10, 2024 · US
US9155181B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9155181-B2 |
| Application number | US-85235210-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 6, 2010 |
| Priority date | Aug 6, 2010 |
| Publication date | Oct 6, 2015 |
| Grant date | Oct 6, 2015 |
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A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.
Opening claim text (preview).
The invention claimed is: 1. A plasma source comprising: a ring plasma chamber disposed in a processing chamber, top the ring plasma chamber having a ring shape which is oriented parallel to the processing chamber top such that the ring plasma chamber does not pass through the processing chamber top and into a corresponding processing chamber; a primary winding around an exterior circumference of the ring plasma chamber; a plurality of ferrites, wherein the ring plasma chambe…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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