Photosensitive organic particles

Patent metadata

Field	Value
Publication number	US-9140989-B2
Application number	US-201214111021-A
Country	US
Kind code	B2
Filing date	Apr 11, 2012
Priority date	Apr 12, 2011
Publication date	Sep 22, 2015
Grant date	Sep 22, 2015

Abstract

A material forms a pattern by applying a photosensitive composition to a base material and drying to form a photosensitive coating and performing exposure and development, and a method for forming the pattern. A photosensitive composition includes water-soluble organic particles, and a solvent, wherein the solvent is a poor solvent for the water-soluble organic particles. Preferably, the water-soluble organic particles of the photosensitive composition includes a polymer which contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility, and the photosensitive composition further includes a photoacid generator. In addition, the water-soluble organic particles of the photosensitive composition includes a polymer which contains the unit structure (A) for forming organic particles, the unit structure (B) for forming interparticle crosslinkage, the unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group.

First claim

The invention claimed is:

1. A photosensitive composition comprising:
water-soluble organic particles;
a solvent; and
a photoacid generator
wherein:
the solvent is a poor solvent for the water-soluble organic particles; and
the water-soluble organic particles include a polymer that contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility.

2. The photosensitive composition according to claim 1 , wherein
the water-soluble organic particles include a polymer which contains the unit structure (A) for forming organic particles, the unit structure (B) for forming interparticle crosslinkage, the unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group.

3. The photosensitive composition according to claim 1 , wherein a monomer forming the unit structure (A) is (meth)acrylic acid amide, N-alkyl(meth)acrylic acid amide, or N-aryl(meth)acrylic acid amide.

4. The photosensitive composition according to claim 1 , wherein a monomer forming the unit structure (B) is N-hydroxyalkyl(meth)acrylic acid amide, N-hydroxyaryl(meth)acrylic acid amide, N-alkoxyalkyl(meth)acrylic acid amide, N-alkoxyaryl(meth)acrylic acid amide, hydroxyalkyl(meth)acrylate, hydroxyaryl(meth)acrylate, alkoxyalkyl(meth)acrylate, or alkoxyaryl(meth)acrylate.

5. The photosensitive composition according to claim 1 , wherein a monomer forming the unit structure (C) is a compound obtained by esterifying (meth)acrylic acid using polyether.

6. The photosensitive composition according to claim 1 , wherein the water-soluble organic particles contain the unit structure (A), the unit structure (B), and the unit structure (C) at a molar ratio of 1:0.01 to 3.00:0.0001 to 0.1 (A:B:C).

7. The photosensitive composition according to claim 2 , wherein the water-soluble organic particles contain the unit structure (A), the unit structure (B), the unit structure (C), and the unit structure (D) at a molar ratio of 1:0.01 to 3.00:0.0001 to 0.1:0.1 to 3.00 (A:B:C:D).

8. The photosensitive composition according to claim 1 , wherein the poor solvent is a solvent including ether, ester, hydrocarbon, ketone, aldehyde, or alcohol.

9. The photosensitive composition according to claim 1 , wherein the poor solvent is a solvent including propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, ethylene glycol monobutyl ether, ethanol, propanol, isopropanol, or butanol.

10. A pattern forming method comprising:
a step of applying the photosensitive composition according to claim 1 to a base material and drying to form a photosensitive coating;
a step of exposing the coating to light through a mask; and
a step of performing developing using a developer.

11. The pattern forming method according to claim 10 , further comprising a step of performing heating after the step of exposing.

12. The pattern forming method according to claim 10 , wherein the developer is water or an aqueous medium.

Assignees

• Kishioka Takahiro
• Umezaki Makiko
• Kimura Shigeo
• Nishimaki Hirokazu
• Ohashi Tomoya
• Usui Yuki
• Nissan Chemical Ind Ltd

Inventors

• Kishioka Takahiro
• Umezaki Makiko
• Kimura Shigeo
• Nishimaki Hirokazu
• Ohashi Tomoya
• Usui Yuki

Classifications

• G03F7/0388

  with ethylenic or acetylenic bands in the side chains of the photopolymer · CPC title

• G03F7/0382

  the macromolecular compound being present in a chemically amplified negative photoresist composition · CPC title

• G03F7/20 Primary

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G03F7/0048

  characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents · CPC title

• C08F220/56

  Acrylamide; Methacrylamide · CPC title