Field-effect semiconductor device

US9136397B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9136397-B2
Application numberUS-201313906738-A
CountryUS
Kind codeB2
Filing dateMay 31, 2013
Priority dateMay 31, 2013
Publication dateSep 15, 2015
Grant dateSep 15, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A field-effect semiconductor device having a semiconductor body with a main surface is provided. The semiconductor body includes, in a vertical cross-section substantially orthogonal to the main surface, a drift layer of a first conductivity type, a semiconductor mesa of the first conductivity type adjoining the drift layer, substantially extending to the main surface and having two side walls, and two second semiconductor regions of a second conductivity type arranged next to the semiconductor mesa. Each of the two second semiconductor regions forms a pn-junction at least with the drift layer. A rectifying junction is formed at least at one of the two side walls of the mesa. Further, a method for producing a heterojunction semiconductor device is provided.

First claim

Opening claim text (preview).

What is claimed is: 1. A field-effect semiconductor device, comprising a semiconductor body having a main surface and comprising in a vertical cross-section substantially orthogonal to the main surface: a drift layer of a first conductivity type; a semiconductor mesa of the first conductivity type adjoining the drift layer, substantially extending to the main surface and comprising a first side wall, with a rectifying junction being formed at the first side wall; and two secon…

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What does patent US9136397B2 cover?
A field-effect semiconductor device having a semiconductor body with a main surface is provided. The semiconductor body includes, in a vertical cross-section substantially orthogonal to the main surface, a drift layer of a first conductivity type, a semiconductor mesa of the first conductivity type adjoining the drift layer, substantially extending to the main surface and having two side walls,…
Who is the assignee on this patent?
Infineon Technologies Ag
What technology area does this patent fall under?
Primary CPC classification H10D62/82. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 15 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).