Method for Manufacturing a Vertical Semiconductor Device and Vertical Semiconductor Device
US-2015115356-A1 · Apr 30, 2015 · US
US9136397B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9136397-B2 |
| Application number | US-201313906738-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 31, 2013 |
| Priority date | May 31, 2013 |
| Publication date | Sep 15, 2015 |
| Grant date | Sep 15, 2015 |
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A field-effect semiconductor device having a semiconductor body with a main surface is provided. The semiconductor body includes, in a vertical cross-section substantially orthogonal to the main surface, a drift layer of a first conductivity type, a semiconductor mesa of the first conductivity type adjoining the drift layer, substantially extending to the main surface and having two side walls, and two second semiconductor regions of a second conductivity type arranged next to the semiconductor mesa. Each of the two second semiconductor regions forms a pn-junction at least with the drift layer. A rectifying junction is formed at least at one of the two side walls of the mesa. Further, a method for producing a heterojunction semiconductor device is provided.
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What is claimed is: 1. A field-effect semiconductor device, comprising a semiconductor body having a main surface and comprising in a vertical cross-section substantially orthogonal to the main surface: a drift layer of a first conductivity type; a semiconductor mesa of the first conductivity type adjoining the drift layer, substantially extending to the main surface and comprising a first side wall, with a rectifying junction being formed at the first side wall; and two secon…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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