Semiconductor memory device and method for manufacturing the same

US9136392B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9136392-B2
Application numberUS-201313971220-A
CountryUS
Kind codeB2
Filing dateAug 20, 2013
Priority dateAug 28, 2012
Publication dateSep 15, 2015
Grant dateSep 15, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

According to one embodiment, the underlying film includes a memory region including a first trench and a peripheral region including a second trench. The stacked body includes conductive layers and insulating layers alternately stacked on the underlying film. The channel body is provided in a pair of first holes and the first trench. The first holes pierce the stacked body to be connected to the first trench. The memory film includes a charge storage film provided between a side wall of the first hole and the channel body, and between an inner wall of the first trench and the channel body. The conductor is provided in a pair of second holes and the second trench. The second holes pierce the stacked body to be connected to the second trench.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor memory device comprising: an underlying film including a memory region and a peripheral region, the memory region including a first trench, the peripheral region including a second trench; a stacked body including a plurality of conductive layers and a plurality of insulating layers alternately stacked on the underlying film; a channel body provided in a pair of first holes and in the first trench, the pair of first holes piercing the sta…

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What does patent US9136392B2 cover?
According to one embodiment, the underlying film includes a memory region including a first trench and a peripheral region including a second trench. The stacked body includes conductive layers and insulating layers alternately stacked on the underlying film. The channel body is provided in a pair of first holes and the first trench. The first holes pierce the stacked body to be connected to th…
Who is the assignee on this patent?
Toshiba Kk
What technology area does this patent fall under?
Primary CPC classification H10D30/0413. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 15 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).