Gate isolation features and methods of fabricating the same in semiconductor devices
US-2024379673-A1 · Nov 14, 2024 · US
US9136371B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9136371-B2 |
| Application number | US-201414543400-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 17, 2014 |
| Priority date | Jul 26, 2012 |
| Publication date | Sep 15, 2015 |
| Grant date | Sep 15, 2015 |
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A monolithic bidirectional switching device includes a drift layer having a first conductivity type and having an upper surface, and first and second vertical metal-oxide semiconductor (MOS) structures at the upper surface of the drift layer. The drift layer provides a common drain for the first and second vertical MOS structures. The first and second vertical MOS structures are protected by respective first and second edge termination structures at the upper surface of the drift layer. A monolithic bidirectional switching device according to further embodiments includes a vertical MOS structure at the upper surface of the drift layer, and a diode at the upper surface of the drift layer. The drift layer provides a drain for the vertical MOS structure and a cathode for the diode, and the vertical MOS structure and the diode are protected by respective first and second edge termination structures.
Opening claim text (preview).
What is claimed is: 1. A monolithic bidirectional switching device, comprising: a drift layer having a first conductivity type and having an upper surface; a vertical metal-oxide semiconductor (MOS) structure at the upper surface of the drift layer; and a diode at the upper surface of the drift layer, wherein the drift layer provides a drain for the vertical MOS structure and a cathode for the diode, and wherein the vertical MOS structure and the diode are surrounded by respec…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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