Integrated Assemblies Having Conductive Posts Extending Through Stacks of Alternating Materials
US-2024237336-A9 · Jul 11, 2024 · US
US9136358B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9136358-B2 |
| Application number | US-201314019788-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 6, 2013 |
| Priority date | Mar 20, 2013 |
| Publication date | Sep 15, 2015 |
| Grant date | Sep 15, 2015 |
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According to one embodiment, a nonvolatile semiconductor memory device includes: a stacked body including a plurality of electrode layers and a plurality of first insulating layers; a first channel body layer penetrating the stacked body; a memory film; an interlayer insulating film provided on the stacked body; a selection gate electrode provided on the interlayer insulating film; a second channel body layer penetrating the selection gate electrode and the interlayer insulating film and connected to the first channel body; a gate insulating film provided between the selection gate electrode and the second channel body layer; a second insulating layer provided on the gate insulating film and on the selection gate electrode; a contact layer provided on the second insulating layer; and a diffusion layer provided between the contact layer and the second insulating layer and connected to the second channel body layer and the contact layer.
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What is claimed is: 1. A nonvolatile semiconductor memory device comprising: a foundation layer; a stacked body provided on the foundation layer, and the stacked body including a plurality of electrode layers and a plurality of first insulating layers alternately stacked; a first semiconductor member extending in the stacked body in a stacking direction of the stacked body; a memory film provided between each of the plurality of electrode layers and the first semiconductor m…
Electricity · mapped topic
Electricity · mapped topic
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